Development of X-ray lithography and nanofabrication techniques for III-V optical devices

This dissertation covers the development of fabrication techniques for Bragg-grating-based integrated optical devices in III-V materials. Work on this rich family of devices has largely been limited to numerical analysis because of the difficulties of their fabrication. The challenges of fabrication are addressed by dividing the problem along two lines: (1) development of an advanced x-ray mask system that addresses future nanolithography needs, and (2) development of fabrication techniques that addresses problems specific to Bragg-grating-based filters. A new x-ray mask configuration is described that improves many aspects of the x-ray mask. A novel means of measuring nondestructively x-ray mask distortion on a global scale was developed, called holographic phase-shifting interferometry (HPSI). This system, in conjunction with appropriate thermal input can potentially provide active correction of x-ray mask distortion. Current microphotonic fabrication issues are presented along with a detailed description of the dual-layer hardmask process (DLHP). The development of the DLHP was specifically geared towards the special requirements of Bragg-grating based microphotonics. Taken as a whole the author hopes that this dissertation serves to facilitate the building of advanced future integrated-optical devices.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2002

Author dc:creator

• Lim, Michael H. (Michael Hong)

Advisor dc:contributor.advisor

• Hemry I. Smith.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/16801

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/16801