Deposition and characterization of very low pressure CVD silicon/silicon-germanium heteroepitaxial structures
type: CreativeWork
description: Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1992
abstract: Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1992
author: Tsai, Curtis.
keywords: Electrical Engineering and Computer Science
license: http://dspace.mit.edu/handle/1721.1/7582
date published: 1992
date modified: 2026-07-22T22:21:36Z
provider: MIT
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Massachusetts Institute of Technology

PropertyValue
property ID: Handle
value: https://hdl.handle.net/1721.1/164703