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Massachusetts Institute of Technology

Silicon wafer integration of ion electrospray thrusters

Abstract

dc:description.abstract

Combining efficiency, simplicity, compactness, and high specific impulse, electrospray thrusters provide a unique solution to the problem of active control in the burgeoning field of miniature satellites. With the potential of distributed systems and low cost functionality currently being realized through development of increasingly smaller spacecraft, thruster research must adjust accordingly. The logical limit of this rapidly accelerating trend is a fully integrated silicon wafer satellite. Such a large surface area to volume ratio, however, both necessitates propulsion capability and renders other mechanisms of control unfeasible due to their respective form factors. While development of electrospray thrusters has exploded in the past two decades, current architectures are similarly incompatible with a silicon wafer substrate. This thesis examines the design and testing of a novel hybrid electrospray architecture which combines previous successes of both capillary and externally-wetted geometries. Our project achieved the first passively-fed, pure ionic emission with silicon emitters. More importantly the micro-manufacturing approach offers key advantages in flexibility and overall performance. Through adaption of a innovative approach to black silicon surface treatment, it is possible to tailor hydraulic impedance in order to maximize propellant flow rate and efficiency for a wide range of mission requirements. The manufactured design exhibits operation in the pure ionic mode with 1-ethyl-3-methylimidazolium tetrafluoroborate and has an emitter density more than an order of magnitude larger than any previous electrospray architecture. Preliminary testing indicates that this will likely translate to a corresponding improvement in thrust density. Further, electrochemical degradation of emitter tips - a primary failure mechanism of electrospray thrusters - appears to occur at a relatively inconsequential rate.

Degree

thesis:*
Name thesis:degree_name
Master
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Aeronautics and Astronautics
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2020

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Siegel, Noah Wittel.
Advisor dc:contributor.advisor
  • Paulo C. Lozano.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • MIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
https://hdl.handle.net/1721.1/130180
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/130180

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Siegel, Noah Wittel.. Silicon wafer integration of ion electrospray thrusters. Massachusetts Institute of Technology, 2020. https://hdl.handle.net/1721.1/130180