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Massachusetts Institute of Technology

Block copolymer self-assembly : lithography, magnetic fabrication, and optimization

Abstract

dc:description.abstract

Block copolymer (BCP) self-assembly is attractive because it provides nanoscale long-range ordered structures in a massive quantity. The capability of generating features with size as low as 5 nm is of particular interest in semiconductor fabrication since current photolithography has reached its resolution limitation and the other competing technologies are either too slow such as e-beam lithography or too expensive such as EUV system. In this thesis, BCP lithography is utilized to fabricate magnetic nanostructure and the corresponding magnetic properties are explored. The polystyrene- b-polydimethylsiloxane (PS-b-PDMS) diblock copolymer with different molecule weight is used to generate various sizes of robust silica pattern after solvent annealing and reactive ion etching. Pattern transfer methods are developed to convert the silica pattern into functional materials, including magnetic materials like cobalt, Co/Pd, FePt and CoFeB magnetic tunnel junctions (MTJ), and MoS2 monolayers. For magnetic nanowire arrays, the interactions between neighboring wires are investigated. For perpendicular MTJ nanopillar arrays, the size-dependent switching behavior and magnetostatic effects between two layers are analyzed. MoS 2 monolayers are patterned into features such as nanodots, nanorods and nanomeshs and the corresponding photoluminescence are characterized. Finally, machine learning and deep learning algorithms are the first-time ever demonstrated to model the BCP self-assembly process. The built model is able to recognize different BCP patterns and predicting the resulting morphology and pattern quality based on experimental process parameters. With this model, the BCP self-assembly can be further optimized toward industrial-grade production.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Materials Science and Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2017

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Tu, Kun-Hua
Advisor dc:contributor.advisor
  • Caroline A. Ross.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/113991
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/113991

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Tu, Kun-Hua. Block copolymer self-assembly : lithography, magnetic fabrication, and optimization. Massachusetts Institute of Technology, 2017. http://hdl.handle.net/1721.1/113991