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Massachusetts Institute of Technology

Advanced electrochemical characterization of copper deposition

Abstract

dc:description.abstract

The electrodeposition of copper metal in a concentrated sulfuric acid solution is reported to occur through a four-step mechanism: (I) the dehydration of Cu2+ (H2O)6, (II) the reduction of Cu2+ to cu+, (III) the dehydration cu+ (H2O)6-x, (IV) the reduction of Cu+ to copper metal. The dehydration steps have been found to be responsible for the pH-dependence of the electrodeposition reaction. It is also reported, although not well understood, that the presence of Fe2+ ions affects the reaction kinetics. In this work, the kinetics of copper electrodeposition were studied using alternating current cyclic voltammetry. The reaction was studied at a copper rotating disk electrode with varying concentrations of Cu2+ and Fe2+ . At sufficiently low pH, and a sufficiently high concentration of Fe2+ , the deposition kinetics may be slowed enough to separately observe the two electron transfer steps involved in copper reduction. It was found that Fe2+ ions affect the electrodeposition kinetic by slowing down reaction kinetics, particularly the second electron transfer reaction.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Materials Science and Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2016

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Wagner, Mary Elizabeth, S.B. Massachusetts Institute of Technology
Advisor dc:contributor.advisor
  • Antoine Allanore.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/110960
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/110960

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Wagner, Mary Elizabeth, S.B. Massachusetts Institute of Technology. Advanced electrochemical characterization of copper deposition. Massachusetts Institute of Technology, 2016. http://hdl.handle.net/1721.1/110960