Synthesis of bilayer graphene and hexagonal boron nitride by chemical vapor deposition method

The aim of this thesis is two-fold: the first is to develop a reliable method for synthesizing bilayer graphene using chemical vapor deposition (CVD) method and to understand the growth mechanism. The second part involves exploring methods of synthesizing hexagonal boron nitride (hBN). The successful isolation of monolayer graphene in 2004 has attracted many researchers to search for potential applications of graphene and other two-dimensional materials in electronic and optical devices. However, the Scotch-tape method sets contraints for such applications due to the limited size and randomized location of obtained flakes. Thus, synthesizing large-area, high-quality two dimensional materials is highly desirable. This thesis seeks to develop a method to produce both bilayers and hBN with large area by CVD method and to investigate the underlying growth mechanisms for better control over the thickness, uniformity and stacking orientation.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2016

Author dc:creator

• Fang, Wenjing, Ph. D. Massachusetts Institute of Technology

Advisor dc:contributor.advisor

• Jing Kong.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/103724

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/103724