{"id":{"repo_id":"missouri","oai_identifier":"oai:mospace.umsystem.edu:10355/6037"},"canonical_url":"https://search.dev.ndltd.org/etd/missouri/oai:mospace.umsystem.edu:10355/6037","repository":{"repo_id":"missouri","name":"University of Missouri","base_url":"https://mospace.umsystem.edu/oai/request"},"display":{"title":"Design and fabrication of one and two axis nickel electroplated micromirror array","abstract":"[ACCESS RESTRICTED TO THE UNIVERSITY OF MISSOURI AT AUTHOR'S REQUEST.] MEMS based micromirror devices are gaining importance at a steady pace in the applications related to optical communications and display technology. This research work describes the design, simulation and fabrication of a new micromachined metallic micromirror array. The work focuses on improved design for reducing actuation voltage and increasing the glass transition temperature for the high temperature applications. The goal is to develop micromirror array for switches and cross connects in optical communications. The micromirror utilizes primarily electroplated nickel, a mechanically durable material with a high glass transition temperature and with controllable residual stress as the main structural material. It also provides high reflectivity to obtain high resolution display. Micromirror arrays with 5x5 pixels were designed with an area between 0.1x0.1 mm2 and 0.5x0.5 mm2 to provide high fill factor and uniform stress distribution. The realization of fabrication of micromirrors was discussed. The micromirror fabrication process can be performed by surface micromachining technologies with a thick photoresist sacrificial layer. The torsion beams were designed with a serpentine shape in order to optimize the voltage necessary to tilt the micromirror by [plus or minus] 10o. Micromirror devices with different beam designs were designed and simulated. The results indicated significant reduction of actuation voltage. The micromirrors were simulated by coupling the mechanical and electrostatic parameters using Coventor, a finite element tool, in order to determine their geometries and electrostatic performance. A voltage of 20 volts was required to rotate the mirror with a diameter of 0.5 mm by 7.680 with resonance frequency of 221.52 Hz. In addition, the 0.5 mm mirror was able to achieve a resonant frequency of 2 kHz with 8.390 tilt angle for 202 V.","abstract_html":"[ACCESS RESTRICTED TO THE UNIVERSITY OF MISSOURI AT AUTHOR'S REQUEST.] MEMS based micromirror devices are gaining importance at a steady pace in the applications related to optical communications and display technology. This research work describes the design, simulation and fabrication of a new micromachined metallic micromirror array. The work focuses on improved design for reducing actuation voltage and increasing the glass transition temperature for the high temperature applications. The goal is to develop micromirror array for switches and cross connects in optical communications. The micromirror utilizes primarily electroplated nickel, a mechanically durable material with a high glass transition temperature and with controllable residual stress as the main structural material. It also provides high reflectivity to obtain high resolution display. Micromirror arrays with 5x5 pixels were designed with an area between 0.1x0.1 mm2 and 0.5x0.5 mm2 to provide high fill factor and uniform stress distribution. The realization of fabrication of micromirrors was discussed. The micromirror fabrication process can be performed by surface micromachining technologies with a thick photoresist sacrificial layer. The torsion beams were designed with a serpentine shape in order to optimize the voltage necessary to tilt the micromirror by [plus or minus] 10o. Micromirror devices with different beam designs were designed and simulated. The results indicated significant reduction of actuation voltage. The micromirrors were simulated by coupling the mechanical and electrostatic parameters using Coventor, a finite element tool, in order to determine their geometries and electrostatic performance. A voltage of 20 volts was required to rotate the mirror with a diameter of 0.5 mm by 7.680 with resonance frequency of 221.52 Hz. In addition, the 0.5 mm mirror was able to achieve a resonant frequency of 2 kHz with 8.390 tilt angle for 202 V.","abstract_has_math":false,"creators":["Tondapu, Karthik"],"institution":"University of Missouri--Columbia","degree_name":"M.S.","degree_level":"Masters","degree_discipline":"Electrical and computer engineering (MU)","degree_department":null,"school":null,"contributors":[],"advisors":["Almasri, Mahmoud"],"committee_chairs":[],"committee_members":[],"year":2007,"date_issued":"2007","date_published":"2007","updated_at":"2026-07-24T03:09:27Z","subjects":[],"languages":["eng","English"],"rights":["Access to files is limited to the campuses of the University of Missouri with SSO login."],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier.doi","label":"DOI","values":["https://doi.org/10.32469/10355/6037"],"render_values":[{"text":"https://doi.org/10.32469/10355/6037","href":"https://doi.org/10.32469/10355/6037","code":true}]}]},"links":{"outbound_url":"https://hdl.handle.net/10355/6037","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Almasri, Mahmoud"]},{"key":"dc:creator","label":"Author","values":["Tondapu, Karthik"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2010-02-24T19:31:21Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2010-02-24T19:31:21Z"]},{"key":"dc:date.issued","label":"Date","values":["2007"]},{"key":"dc:publisher","label":"Institution","values":["University of Missouri--Columbia"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical and computer engineering (MU)"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Masters"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Missouri--Columbia"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["English"]},{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["Access to files is limited to the campuses of the University of Missouri with SSO login."]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.doi","label":"DOI","values":["https://doi.org/10.32469/10355/6037"]},{"key":"dc:identifier.uri","label":"Identifier URI","values":["https://hdl.handle.net/10355/6037"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The entire dissertation/thesis text is included in the research.pdf file; the official abstract appears in the short.pdf file (which also appears in the research.pdf); a non-technical general description, or public abstract, appears in the public.pdf file.","Title from title screen of research.pdf file (viewed on April 15, 2008)","Includes bibliographical references.","Thesis (M.S.) University of Missouri-Columbia 2007.","Dissertations, Academic -- University of Missouri--Columbia -- Electrical engineering."]},{"key":"dc:description.abstract","label":"Abstract","values":["[ACCESS RESTRICTED TO THE UNIVERSITY OF MISSOURI AT AUTHOR'S REQUEST.] MEMS based micromirror devices are gaining importance at a steady pace in the applications related to optical communications and display technology. This research work describes the design, simulation and fabrication of a new micromachined metallic micromirror array. The work focuses on improved design for reducing actuation voltage and increasing the glass transition temperature for the high temperature applications. The goal is to develop micromirror array for switches and cross connects in optical communications. The micromirror utilizes primarily electroplated nickel, a mechanically durable material with a high glass transition temperature and with controllable residual stress as the main structural material. It also provides high reflectivity to obtain high resolution display. Micromirror arrays with 5x5 pixels were designed with an area between 0.1x0.1 mm2 and 0.5x0.5 mm2 to provide high fill factor and uniform stress distribution. The realization of fabrication of micromirrors was discussed. The micromirror fabrication process can be performed by surface micromachining technologies with a thick photoresist sacrificial layer. The torsion beams were designed with a serpentine shape in order to optimize the voltage necessary to tilt the micromirror by [plus or minus] 10o. Micromirror devices with different beam designs were designed and simulated. The results indicated significant reduction of actuation voltage. The micromirrors were simulated by coupling the mechanical and electrostatic parameters using Coventor, a finite element tool, in order to determine their geometries and electrostatic performance. A voltage of 20 volts was required to rotate the mirror with a diameter of 0.5 mm by 7.680 with resonance frequency of 221.52 Hz. In addition, the 0.5 mm mirror was able to achieve a resonant frequency of 2 kHz with 8.390 tilt angle for 202 V."]},{"key":"dc:title","label":"Title","values":["Design and fabrication of one and two axis nickel electroplated micromirror array"]}]}],"canonical_facts":{"dc:contributor.advisor":["Almasri, Mahmoud"],"dc:creator":["Tondapu, Karthik"],"dc:date.accessioned":["2010-02-24T19:31:21Z"],"dc:date.available":["2010-02-24T19:31:21Z"],"dc:date.issued":["2007"],"dc:description":["The entire dissertation/thesis text is included in the research.pdf file; the official abstract appears in the short.pdf file (which also appears in the research.pdf); a non-technical general description, or public abstract, appears in the public.pdf file.","Title from title screen of research.pdf file (viewed on April 15, 2008)","Includes bibliographical references.","Thesis (M.S.) University of Missouri-Columbia 2007.","Dissertations, Academic -- University of Missouri--Columbia -- Electrical engineering."],"dc:description.abstract":["[ACCESS RESTRICTED TO THE UNIVERSITY OF MISSOURI AT AUTHOR'S REQUEST.] MEMS based micromirror devices are gaining importance at a steady pace in the applications related to optical communications and display technology. This research work describes the design, simulation and fabrication of a new micromachined metallic micromirror array. The work focuses on improved design for reducing actuation voltage and increasing the glass transition temperature for the high temperature applications. The goal is to develop micromirror array for switches and cross connects in optical communications. The micromirror utilizes primarily electroplated nickel, a mechanically durable material with a high glass transition temperature and with controllable residual stress as the main structural material. It also provides high reflectivity to obtain high resolution display. Micromirror arrays with 5x5 pixels were designed with an area between 0.1x0.1 mm2 and 0.5x0.5 mm2 to provide high fill factor and uniform stress distribution. The realization of fabrication of micromirrors was discussed. The micromirror fabrication process can be performed by surface micromachining technologies with a thick photoresist sacrificial layer. The torsion beams were designed with a serpentine shape in order to optimize the voltage necessary to tilt the micromirror by [plus or minus] 10o. Micromirror devices with different beam designs were designed and simulated. The results indicated significant reduction of actuation voltage. The micromirrors were simulated by coupling the mechanical and electrostatic parameters using Coventor, a finite element tool, in order to determine their geometries and electrostatic performance. A voltage of 20 volts was required to rotate the mirror with a diameter of 0.5 mm by 7.680 with resonance frequency of 221.52 Hz. In addition, the 0.5 mm mirror was able to achieve a resonant frequency of 2 kHz with 8.390 tilt angle for 202 V."],"dc:identifier.doi":["https://doi.org/10.32469/10355/6037"],"dc:identifier.uri":["https://hdl.handle.net/10355/6037"],"dc:language":["English"],"dc:language.iso":["eng"],"dc:publisher":["University of Missouri--Columbia"],"dc:rights":["Access to files is limited to the campuses of the University of Missouri with SSO login."],"dc:title":["Design and fabrication of one and two axis nickel electroplated micromirror array"],"dc:type":["Thesis"],"thesis:degree_discipline":["Electrical and computer engineering (MU)"],"thesis:degree_level":["Masters"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Missouri--Columbia"]},"updated_at":"2026-07-24T03:09:27Z"}