CHARACTERIZATION OF BCl₃, SF₆, and BCl₃/SF₆ PLASMAS USING LANGMUIR PROBE MEASUREMENTS

A Langmuir probe study in BCl3, SF6, and mixtures of BCl3/SF6 capacitively-coupled plasmas is presented. In this study, energy distribution functions, electron temperatures (and average electron energy) and electron, positive ion, and negative ion densities were determined as a function of process conditions such as RF power, chamber pressure, and SF6 percentage in the total flow. With the addition of only 10% SF6 to the BCl3 plasma, the electron density rapidly halved to 5.7 x 108 cm-3, and the electron temperature sharply increased to ~4.3 eV (~1.1 eV increase). This is characteristic of electron attachment heating, whereby low energy electrons attach to species within the plasma, and the average energy of the fewer remaining electrons must increase in order to sustain the same power dissipation. These results confirm that the increased dissociation and enhancement in GaAs etch rate with SF6 added to BCl3 plasmas was due to electron attachment heating.

Grantor dc:publisher

University of Kansas

Year dc:date.issued

2009

Author dc:creator

• Alexander, John

Advisor dc:contributor.advisor

• Nordheden, Karen J.

• Chemical engineering
• Electronics and electrical engineering
• Physics
• Fluid and plasma
• Bcl3/sf6 plasma
• Electron attachment
• Langmuir probe

Statement dc:rights

• This item is protected by copyright and unless otherwise specified the copyright of this thesis/dissertation is held by the author.

Language dc:language.iso

EN

Dc Identifier Other

http://dissertations.umi.com/ku:10443

OAI identifier oai:identifier

oai:kuscholarworks.ku.edu:1808/5315