Structure Evolution of Biaxially Aligned Thin Films Deposited by Sputtering

In this work, biaxially aligned thin films are deposited on an inclined substrate by unbalanced magnetron sputtering. Biaxially aligned thin films are polycrystalline thin films whereby the crystallographic orientation of the grains is aligned along two axes, i.e. perpendicular (out-of-plane) and parallel (in-plane) to the substrate. In the limit, all grains are perfectly aligned and the thin film bears likeness to single crystalline films. To elucidate the growth mechanism, biaxially aligned MgO, InN and Cr thin films are deposited. A model for the structure evolution of the out-of-plane and in-plane alignment is developed and is based on evolutionary selection and directional diffusion. Additionally, the biaxially aligned thin films are optimized and a optimal misfit of 15° between the grains in the thin film is obtained. With the codeposition of foreign elements, the structure evolution can strongly deviate from the proposed model because even a small amount of impurities will modify the atomistic processes. It is observed that the codeposition of even a tiny amount of impurities causes a texture change in the biaxially aligned thin films.

Author dc:creator

• Ghekiere, Pieter

Contributors dc:contributor

• De Gryse, R

Statement dc:rights

• info:eu-repo/semantics/openAccess

Language dc:language

und

Identifier

https://biblio.ugent.be/publication/468868
http://doi.org/1854/7197
https://biblio.ugent.be/publication/468868/file/1879654

OAI identifier oai:identifier

oai:archive.ugent.be:468868