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Cornell University
Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity
Degree
thesis:*- Name thesis:degree_name
- Ph. D., Chemical Engineering
- Level thesis:degree_level
- Doctor of Philosophy
- Discipline thesis:degree_discipline
- Chemical Engineering
- Grantor
- Cornell University
- Year dc:date.issued
- 2016
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Zhang, Wenyu
- Committee members dc:contributor.committeemember
-
- Hanrath,Tobias
- Schlom,Darrell
Subjects
dc:subject × 3Rights
- Language dc:language.iso
- en_US
Identifiers
dc:identifier.*- Handle dc:identifier.uri
- https://hdl.handle.net/1813/43730
- OAI identifier oai:identifier
- oai:ecommons.cornell.edu:1813/43730