{"id":{"repo_id":"buffalo","oai_identifier":"oai:ubir.buffalo.edu:10477/86667"},"canonical_url":"https://search.dev.ndltd.org/etd/buffalo/oai:ubir.buffalo.edu:10477/86667","repository":{"repo_id":"buffalo","name":"Buffalo","base_url":"https://ubir.buffalo.edu/oai/request"},"display":{"title":"Linear and Bottlebrush Block Copolymers with Highly Incompatible Segments","abstract":"Ph.D.","abstract_html":"Ph.D.","abstract_has_math":false,"creators":["Smith, Darren; 0000-0003-4381-9553"],"institution":"State University of New York at Buffalo","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":["Rzayev, Javid","Chemistry"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2025,"date_issued":"2025-02-21T21:36:15Z","date_published":"2025-02-21T21:36:15Z","updated_at":"2026-07-27T19:05:34Z","subjects":["chemistry","polymer chemistry","organic chemistry"],"languages":["eng"],"rights":["Users of works found in University at Buffalo Institutional Repository (UBIR) are responsible for identifying and contacting the copyright owner for permission to reuse. 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University at Buffalo Libraries do not manage rights for copyright-protected works and cannot assist with permissions.","Copyright retained by author."]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/10477/86667"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Ph.D.","The rapid development of miniaturized electronic devices has motivated the creation of methods for the production of nanomaterials with sub-10 nm features. Block copolymer self-assembly is a highly effective bottom-up approach to generating nanostructured materials. Two major challenges stand in the way of using block copolymer for the fabrication of patterns with ultrasmall pitch sizes: (1) the access to polymers with high segmental interaction parameter that drives phase separation at very small chain lengths, and (2) methods of orientating block copolymer morphology perpendicular to the substrate in thin films. The research presented in this thesis explores new chemistries and polymer architectures to address the above mentioned challenges...","**To request an accessible version of the file(s) associated with this item, contact library@buffalo.edu. Please include the item's persistent URL [http://hdl.handle.net/. . .] in your request.**"]},{"key":"dc:format","label":"Dc Format","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Linear and Bottlebrush Block Copolymers with Highly Incompatible Segments"]}]}],"canonical_facts":{"dc:contributor":["Rzayev, Javid","Chemistry"],"dc:creator":["Smith, Darren; 0000-0003-4381-9553"],"dc:date":["2025-02-21T21:36:15Z","2020"],"dc:description":["Ph.D.","The rapid development of miniaturized electronic devices has motivated the creation of methods for the production of nanomaterials with sub-10 nm features. Block copolymer self-assembly is a highly effective bottom-up approach to generating nanostructured materials. Two major challenges stand in the way of using block copolymer for the fabrication of patterns with ultrasmall pitch sizes: (1) the access to polymers with high segmental interaction parameter that drives phase separation at very small chain lengths, and (2) methods of orientating block copolymer morphology perpendicular to the substrate in thin films. The research presented in this thesis explores new chemistries and polymer architectures to address the above mentioned challenges...","**To request an accessible version of the file(s) associated with this item, contact library@buffalo.edu. 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