{"id":{"repo_id":"buffalo","oai_identifier":"oai:ubir.buffalo.edu:10477/79998"},"canonical_url":"https://search.dev.ndltd.org/etd/buffalo/oai:ubir.buffalo.edu:10477/79998","repository":{"repo_id":"buffalo","name":"Buffalo","base_url":"https://ubir.buffalo.edu/oai/request"},"display":{"title":"Dynamics and Applications of Plasmonically Induced Resistance in Metal Nanogratings","abstract":"Ph.D.","abstract_html":"Ph.D.","abstract_has_math":false,"creators":["Cheney, Alec; 0000-0002-3982-9946"],"institution":"State University of New York at Buffalo","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":["Cartwright, Alexander","Electrical Engineering"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2019,"date_issued":"2019-07-30T15:11:43Z","date_published":"2019-07-30T15:11:43Z","updated_at":"2026-07-27T19:05:21Z","subjects":["applied physics","optics"],"languages":["eng"],"rights":["Users of works found in University at Buffalo Institutional Repository (UBIR) are responsible for identifying and contacting the copyright owner for permission to reuse. University at Buffalo Libraries do not manage rights for copyright-protected works and cannot assist with permissions.","Copyright retained by author."],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/10477/79998","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Cartwright, Alexander","Electrical Engineering"]},{"key":"dc:creator","label":"Author","values":["Cheney, Alec; 0000-0002-3982-9946"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2019-07-30T15:11:43Z","2019","2019-05-16 22:41:00"]},{"key":"dc:publisher","label":"Institution","values":["State University of New York at Buffalo"]},{"key":"dc:type","label":"Dc Type","values":["Text","Dissertation"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["applied physics","optics"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["Users of works found in University at Buffalo Institutional Repository (UBIR) are responsible for identifying and contacting the copyright owner for permission to reuse. University at Buffalo Libraries do not manage rights for copyright-protected works and cannot assist with permissions.","Copyright retained by author."]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/10477/79998"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Ph.D.","This dissertation examines the mechanisms that enable the detection of surface plasmons using direct electronic measurements rather than established optical techniques, and considers potential applications that arise as a result. Surface plasmons are optically excited in metal thin film nanogratings fabricated from gold, aluminum, or titanium. It is shown that surface plasmon excitation leads to a measurable increase in electronic resistance that depends on both the polarization and the power of incident light. Addition-ally, it is shown that the electronic resistance of these plasmonic structures shows strong dependence on the wavelength of the incident light. Both of these results are in agreement with known momentum matching requirements of surface plasmon excitation. The different metals used for access to different scattering and absorption mechanisms. It is thus shown that the resistance induced by surface plasmon excitation is primarily dependent on electron-electron scattering. This is in contrast to DC resistance, which is dominated by electron-phonon scattering at room temperature. A model is established that takes into account the scattering of electrons excited from surface plasmons with electrons from an applied current. This model considers the asymmetry of the Fermi level under an applied bias and the resulting imbalance in the momentum contributions of plasmonically excited hot electrons in the system. This imbalance leads to a restoring of the overall system momentum that does not depend strongly on electron-phonon interactions."]},{"key":"dc:format","label":"Dc Format","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Dynamics and Applications of Plasmonically Induced Resistance in Metal Nanogratings"]}]}],"canonical_facts":{"dc:contributor":["Cartwright, Alexander","Electrical Engineering"],"dc:creator":["Cheney, Alec; 0000-0002-3982-9946"],"dc:date":["2019-07-30T15:11:43Z","2019","2019-05-16 22:41:00"],"dc:description":["Ph.D.","This dissertation examines the mechanisms that enable the detection of surface plasmons using direct electronic measurements rather than established optical techniques, and considers potential applications that arise as a result. Surface plasmons are optically excited in metal thin film nanogratings fabricated from gold, aluminum, or titanium. It is shown that surface plasmon excitation leads to a measurable increase in electronic resistance that depends on both the polarization and the power of incident light. Addition-ally, it is shown that the electronic resistance of these plasmonic structures shows strong dependence on the wavelength of the incident light. Both of these results are in agreement with known momentum matching requirements of surface plasmon excitation. The different metals used for access to different scattering and absorption mechanisms. It is thus shown that the resistance induced by surface plasmon excitation is primarily dependent on electron-electron scattering. This is in contrast to DC resistance, which is dominated by electron-phonon scattering at room temperature. A model is established that takes into account the scattering of electrons excited from surface plasmons with electrons from an applied current. This model considers the asymmetry of the Fermi level under an applied bias and the resulting imbalance in the momentum contributions of plasmonically excited hot electrons in the system. This imbalance leads to a restoring of the overall system momentum that does not depend strongly on electron-phonon interactions."],"dc:format":["application/pdf"],"dc:identifier":["http://hdl.handle.net/10477/79998"],"dc:language":["eng"],"dc:publisher":["State University of New York at Buffalo"],"dc:rights":["Users of works found in University at Buffalo Institutional Repository (UBIR) are responsible for identifying and contacting the copyright owner for permission to reuse. University at Buffalo Libraries do not manage rights for copyright-protected works and cannot assist with permissions.","Copyright retained by author."],"dc:subject":["applied physics","optics"],"dc:title":["Dynamics and Applications of Plasmonically Induced Resistance in Metal Nanogratings"],"dc:type":["Text","Dissertation"]},"updated_at":"2026-07-27T19:05:21Z"}