Conventional integrated electronics have reached a physical limit, and their efficiency has been influenced by the generated heat in the high-density electronic packages. Integrated photonic circuits based on the highly developed Si complementary-metal-oxide-semiconductor (CMOS) infrastructure was proposed as a viable solution; however, Si-based emitters are the most challenging component for the monolithic integrated photonic circuits. The indirect bandgap of silicon and germanium is a bottleneck for the further development of photonic and optoelectronic integrated circuits.
The Ge1-xSnx alloy, a group IV material system compatible with Si CMOS technology, was suggested as a desirable material that theoretically exhibits a direct bandgap when Sn composition increases. Last decade, efforts were made to develop high quality Ge1-xSnx films on Si substrate using commercial reactors. Moreover, the effect of Sn composition on the bandgap energy of Ge1-xSnx alloys was theoretically investigated.
In this work, the development of Si-based Ge1-xSnx emitters was pursued with study the temperature-dependent bandgap emission of Ge1-xSnx structures for the short-wave infrared (SWIR) wavelength range (between 1.5 to 3 µm). The photoluminescence (PL) emissions from the bandgap of Ge1-xSnx films were investigated and a direct bandgap Ge1-xSnx was demonstrated for the first time based on the careful analysis of the PL spectra line-width and also the strain-dependent bandgap concept. In addition, the Ge1-xSnx advanced structure including SiGeSn/GeSn/SiGeSn single quantum well (QW) and Ge/Ge0.92Sn0.08/Ge double heterostructures (DHS) were studied. The GeSn QW PL emission was scrutinized from 10 to 300 K and the carrier confinement was analyzed through band offset calculations in the QW structure. Moreover, the electrical and optical characteristics of n-i-p Ge/Ge0.92Sn0.08/Ge light emitting diodes (LEDs) with surface emitting and edge emitting configurations were examined at different temperatures. Additionally, the lasing performance from the DHS Ge/Ge0.89Sn0.11/Ge waveguide was experimentally investigated based on the concept of direct bandgap Ge1-xSnx films and the confinement of carriers and optical field within the Ge/Ge0.89Sn0.11/Ge structure. Finally, an optimized QW design has been proposed that features a direct bandgap Ge0.9Sn0.1 QW with Type-I band alignment favorable for the high carrier confinement and low threshold Ge1-xSnx QW devices.
","abstract_html":"<p>Conventional integrated electronics have reached a physical limit, and their efficiency has been influenced by the generated heat in the high-density electronic packages. Integrated photonic circuits based on the highly developed Si complementary-metal-oxide-semiconductor (CMOS) infrastructure was proposed as a viable solution; however, Si-based emitters are the most challenging component for the monolithic integrated photonic circuits. The indirect bandgap of silicon and germanium is a bottleneck for the further development of photonic and optoelectronic integrated circuits.</p> <p>The Ge1-xSnx alloy, a group IV material system compatible with Si CMOS technology, was suggested as a desirable material that theoretically exhibits a direct bandgap when Sn composition increases. Last decade, efforts were made to develop high quality Ge1-xSnx films on Si substrate using commercial reactors. Moreover, the effect of Sn composition on the bandgap energy of Ge1-xSnx alloys was theoretically investigated.</p> <p>In this work, the development of Si-based Ge1-xSnx emitters was pursued with study the temperature-dependent bandgap emission of Ge1-xSnx structures for the short-wave infrared (SWIR) wavelength range (between 1.5 to 3 µm). The photoluminescence (PL) emissions from the bandgap of Ge1-xSnx films were investigated and a direct bandgap Ge1-xSnx was demonstrated for the first time based on the careful analysis of the PL spectra line-width and also the strain-dependent bandgap concept. In addition, the Ge1-xSnx advanced structure including SiGeSn/GeSn/SiGeSn single quantum well (QW) and Ge/Ge0.92Sn0.08/Ge double heterostructures (DHS) were studied. The GeSn QW PL emission was scrutinized from 10 to 300 K and the carrier confinement was analyzed through band offset calculations in the QW structure. Moreover, the electrical and optical characteristics of n-i-p Ge/Ge0.92Sn0.08/Ge light emitting diodes (LEDs) with surface emitting and edge emitting configurations were examined at different temperatures. Additionally, the lasing performance from the DHS Ge/Ge0.89Sn0.11/Ge waveguide was experimentally investigated based on the concept of direct bandgap Ge1-xSnx films and the confinement of carriers and optical field within the Ge/Ge0.89Sn0.11/Ge structure. Finally, an optimized QW design has been proposed that features a direct bandgap Ge0.9Sn0.1 QW with Type-I band alignment favorable for the high carrier confinement and low threshold Ge1-xSnx QW devices.</p>","abstract_has_math":false,"creators":["Ghetmiri, Seyed Amir"],"institution":null,"degree_name":"Doctor of Philosophy in Microelectronics-Photonics (PhD)","degree_level":"Dissertation","degree_discipline":null,"degree_department":null,"school":null,"contributors":["Salamo, Gregory J.","Naseem, Hameed A."],"advisors":["Yu, Shui-Qing \"Fisher\""],"committee_chairs":[],"committee_members":[],"year":2016,"date_issued":"2016-12-01T08:00:00Z","date_published":"2016-12-01T08:00:00Z","updated_at":"2026-07-24T00:59:24Z","subjects":["Applied sciences","Gesn emitters","Infrared","Optoelectronics","Si photonics","Electronic Devices and Semiconductor Manufacturing","VLSI and Circuits, Embedded and Hardware Systems"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://scholarworks.uark.edu/etd/1824","outbound_label":"Repository record","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Salamo, Gregory J.","Naseem, Hameed A."]},{"key":"dc:contributor.advisor","label":"Advisor","values":["Yu, Shui-Qing \"Fisher\""]},{"key":"dc:creator","label":"Author","values":["Ghetmiri, Seyed Amir"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2016"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2017-09-29T07:00:00Z"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Doctor of Philosophy in Microelectronics-Photonics (PhD)"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Applied sciences","Gesn emitters","Infrared","Optoelectronics","Si photonics","Electronic Devices and Semiconductor Manufacturing","VLSI and Circuits, Embedded and Hardware Systems"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://scholarworks.uark.edu/etd/1824"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Conventional integrated electronics have reached a physical limit, and their efficiency has been influenced by the generated heat in the high-density electronic packages. Integrated photonic circuits based on the highly developed Si complementary-metal-oxide-semiconductor (CMOS) infrastructure was proposed as a viable solution; however, Si-based emitters are the most challenging component for the monolithic integrated photonic circuits. The indirect bandgap of silicon and germanium is a bottleneck for the further development of photonic and optoelectronic integrated circuits.
The Ge1-xSnx alloy, a group IV material system compatible with Si CMOS technology, was suggested as a desirable material that theoretically exhibits a direct bandgap when Sn composition increases. Last decade, efforts were made to develop high quality Ge1-xSnx films on Si substrate using commercial reactors. Moreover, the effect of Sn composition on the bandgap energy of Ge1-xSnx alloys was theoretically investigated.
In this work, the development of Si-based Ge1-xSnx emitters was pursued with study the temperature-dependent bandgap emission of Ge1-xSnx structures for the short-wave infrared (SWIR) wavelength range (between 1.5 to 3 µm). The photoluminescence (PL) emissions from the bandgap of Ge1-xSnx films were investigated and a direct bandgap Ge1-xSnx was demonstrated for the first time based on the careful analysis of the PL spectra line-width and also the strain-dependent bandgap concept. In addition, the Ge1-xSnx advanced structure including SiGeSn/GeSn/SiGeSn single quantum well (QW) and Ge/Ge0.92Sn0.08/Ge double heterostructures (DHS) were studied. The GeSn QW PL emission was scrutinized from 10 to 300 K and the carrier confinement was analyzed through band offset calculations in the QW structure. Moreover, the electrical and optical characteristics of n-i-p Ge/Ge0.92Sn0.08/Ge light emitting diodes (LEDs) with surface emitting and edge emitting configurations were examined at different temperatures. Additionally, the lasing performance from the DHS Ge/Ge0.89Sn0.11/Ge waveguide was experimentally investigated based on the concept of direct bandgap Ge1-xSnx films and the confinement of carriers and optical field within the Ge/Ge0.89Sn0.11/Ge structure. Finally, an optimized QW design has been proposed that features a direct bandgap Ge0.9Sn0.1 QW with Type-I band alignment favorable for the high carrier confinement and low threshold Ge1-xSnx QW devices.
"]},{"key":"dc:title","label":"Title","values":["Si-based Germanium-Tin (GeSn) Emitters for Short-Wave Infrared Optoelectronics"]}]}],"canonical_facts":{"dc:contributor":["Salamo, Gregory J.","Naseem, Hameed A."],"dc:contributor.advisor":["Yu, Shui-Qing \"Fisher\""],"dc:creator":["Ghetmiri, Seyed Amir"],"dc:date":["2016"],"dc:date.available":["2017-09-29T07:00:00Z"],"dc:description.abstract":["Conventional integrated electronics have reached a physical limit, and their efficiency has been influenced by the generated heat in the high-density electronic packages. Integrated photonic circuits based on the highly developed Si complementary-metal-oxide-semiconductor (CMOS) infrastructure was proposed as a viable solution; however, Si-based emitters are the most challenging component for the monolithic integrated photonic circuits. The indirect bandgap of silicon and germanium is a bottleneck for the further development of photonic and optoelectronic integrated circuits.
The Ge1-xSnx alloy, a group IV material system compatible with Si CMOS technology, was suggested as a desirable material that theoretically exhibits a direct bandgap when Sn composition increases. Last decade, efforts were made to develop high quality Ge1-xSnx films on Si substrate using commercial reactors. Moreover, the effect of Sn composition on the bandgap energy of Ge1-xSnx alloys was theoretically investigated.
In this work, the development of Si-based Ge1-xSnx emitters was pursued with study the temperature-dependent bandgap emission of Ge1-xSnx structures for the short-wave infrared (SWIR) wavelength range (between 1.5 to 3 µm). The photoluminescence (PL) emissions from the bandgap of Ge1-xSnx films were investigated and a direct bandgap Ge1-xSnx was demonstrated for the first time based on the careful analysis of the PL spectra line-width and also the strain-dependent bandgap concept. In addition, the Ge1-xSnx advanced structure including SiGeSn/GeSn/SiGeSn single quantum well (QW) and Ge/Ge0.92Sn0.08/Ge double heterostructures (DHS) were studied. The GeSn QW PL emission was scrutinized from 10 to 300 K and the carrier confinement was analyzed through band offset calculations in the QW structure. Moreover, the electrical and optical characteristics of n-i-p Ge/Ge0.92Sn0.08/Ge light emitting diodes (LEDs) with surface emitting and edge emitting configurations were examined at different temperatures. Additionally, the lasing performance from the DHS Ge/Ge0.89Sn0.11/Ge waveguide was experimentally investigated based on the concept of direct bandgap Ge1-xSnx films and the confinement of carriers and optical field within the Ge/Ge0.89Sn0.11/Ge structure. Finally, an optimized QW design has been proposed that features a direct bandgap Ge0.9Sn0.1 QW with Type-I band alignment favorable for the high carrier confinement and low threshold Ge1-xSnx QW devices.
"],"dc:identifier":["https://scholarworks.uark.edu/etd/1824"],"dc:subject":["Applied sciences","Gesn emitters","Infrared","Optoelectronics","Si photonics","Electronic Devices and Semiconductor Manufacturing","VLSI and Circuits, Embedded and Hardware Systems"],"dc:title":["Si-based Germanium-Tin (GeSn) Emitters for Short-Wave Infrared Optoelectronics"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Doctor of Philosophy in Microelectronics-Photonics (PhD)"]},"updated_at":"2026-07-24T00:59:24Z"}