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Australian National University

Etching and deposition with SiCl4 in the helicon reactor

dc:creator Jarnyk, Mark

dc:date.issued1997

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Jarnyk, Mark

Rights

Language dc:language.iso: en_AU

Identifiers

dc:identifier.*

Dc Identifier Other: b1985151
OAI identifier oai:identifier: oai:openresearch-repository.anu.edu.au:1885/145925

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source

Harvested from: Australian National University
Base URL: openresearch-repository.anu.edu.au/server/oai/request
Last updated: 2026-07-24
Source record: OAI-PMH GetRecord

related terms

anu
1997

citation

Jarnyk, Mark. Etching and deposition with SiCl4 in the helicon reactor. 1997. http://hdl.handle.net/1885/145925

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