Der Einsatz von Simulationen zur Untersuchung von Fehlereinflüssen in der Interferometrie

The knowledge of measurement uncertainties is an elementary requirement for the proper assessment of product-quality and for controlling production processes. Furthermore, the determination of measurement uncertainties is essential to ensure the comparability with other types of metrological instruments. Interferometers are amongst the most precise metrological instruments used by today's industry. But in the case of interferometers it is difficult to determine all possible error-sources and to quantitatively estimate their contribution to the measurement uncertainty. An approach to a systematic assessment of interferometer-errors and their effects on a specific measurement is the simulation of interferometric measurements in a virtual environment. For this reason a simulation tool, the so called virtual interferometer, had been developed which is completely based on non-sequential raytracing. The virtual interferometer allows simulation of interferometrical measurements under accurately specified and, thus, perfectly known conditions, helping to provide very detailed information on the measurement uncertainty. Monte Carlo analysis is a very effective method for studying complex systems with many degrees of freedom. In this work this method was used e.g. to quantitatively determine the influence of a misaligned optical interferometer setup. The Monte Carlo method was also used to analyse the effect of vibration on the phaseshift procedure which is used for interferogram evaluation. It was shown that the measurement error not only is affected by the vibrational conditions but also by the integration time of the CCD detector. Furthermore the measurement error is strongly influenced by the electronic characteristics of the CCD detector and the phaseshift algorithms used. Some error influences, however, like environmental changes, can not be modelled by conventional optical simulation. By the combination of finite element analysis with the virtual interferometer emulation of such error influences becomes possible. This opto-mechanical approach was used to study the deformation of optical interferometer components due to thermal expansion and mechanical stress.

Grantor dc:publisher

Publikationsserver der RWTH Aachen University

Year dc:date

2004

Author dc:creator

• Bai, Alexander

Contributors dc:contributor

• Pfeifer, Tilo

• info:eu-repo/classification/ddc/530
• Interferometrie
• Messfehler
• Computersimulation
• Physik
• Simulation
• Messunsicherheit

Statement dc:rights

• info:eu-repo/semantics/openAccess

Language dc:language

ger

Identifier

https://publications.rwth-aachen.de/search?p=id:%22RWTH-CONV-115204%22

OAI record oai:identifier

https://publications.rwth-aachen.de/oai2d?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai%3Apublications.rwth-aachen.de%3A53024