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Showing 1 to 8 of 8 for “"xenon difluoride"”.
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The interaction of xenon difluoride with Si(100)
The interaction of low energy XeF2 with Si(100)2x1 has been investigated by studying both the surface-bound and gas-phase products of the reaction. Helium atom diffraction, beam-surface scattering and thermal desorption measurements are the major techniques used to probe the surface-bound products …
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The interactions of molecular fluorine and xenon difluoride with silicon
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 1999.
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Xenon difluoride etching and molecular oxygen oxidation of silicon by reactive scattering
While both molecular fluorine (F₂) and xenon difluoride (XeF₂) fluorinate Si(l00)2xI surfaces at coverages up to one monolayer, fluorine is unable to cleave Si-Si bonds that ultimately leads to etching silicon at coverages above one monolayer (reaction probability 9x 10-⁴) while XeF₂ does so …
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The chemical dynamics of XeF₂ and Xe(F₂) reactions with Si(100)
The chemistry of fluorine, F2, and xenon difluoride, XeF2, with clean Si are nearly indistinguishable. Both species react via the atom abstraction mechanism, whereby a surface dangling bond abstracts a F atom from the incident molecule, scattering the complementary F atom or XeF fragment into the …
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Flexible Mems: A Novel Technology To Fabricate Flexible Sensors And Electronics
… substrates. A novel technology based on XeF2(xenon difluoride) isotropic silicon etching and parylene conformal coating, which is able to monolithically incorporate high temperature materials and fluidic channels, was developed at Wayne State University.</p> <p> The technology was first …
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Boundary conditioning concept applied to the synthesis of microsystems using fuzzy logic approach
… process, and by post-releasing with gas phase xenon difluoride etching. The etching is described along with the details of the setup, the etching procedure and the effect of etching on end conditions of the fabricated structure. The types of structures fabricated show that they can be adopted …
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The role of lattice excitation in Si etching
The chemistries of fluorine, F₂, and xenon difluoride, XeF₂, with clean Si are basically the same, while their chemistries diverge dramatically past I ML F coverage. With a clean Si surface, F₂ and XeF₂ react utilizing an atom abstraction mechanism, where a surface dangling bond abstracts a F atom …
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Graphene etch mask for silicon
In this thesis, an alternative future use for graphene will be explored. Graphene, a popular two-dimensional material of remarkable electrical properties, has been thought to be a successor to current day microelectronic materials. With the many challenges posed by the manufacture of conventional …