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Showing 1 to 2 of 2 for “"ultralow-k"”.
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Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications
… of research has been in the area of low-k and ultralow-k dielectric materials. Dielectric materials play a key role in semiconductor manufacturing, as they are the insulating material between the metal lines that conduct electronic signals back and forth over a chip. Reducing the dielectric …
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Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition
Use of low relative dielectric constant (low-k) material as an interlayer dielectric is among important approaches to reduce the RC time delay in high performance ultra-large-scale integrated circuits. Copper metallization is another approach besides the use of low-k material, in reducing the RC …