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Showing 1 to 9 of 9 for “"transition metal nitride"”.
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Ultraconformal chemical vapor deposition and synthesis of transition metal nitride films
… to conformally deposit stoichiometric and pure metallic films of hafnium diboride and iron in high AR features. By achieving high precursor pressure, growth rate saturation is maintained deeply into structures. CVD has a growth rate advantage over atomic layer deposition in high AR features. …
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Microstructure and properties of transition metal nitride and medium entropy alloy coatings
… in both the bottom and middle layers. The transition from fcc to bcc phase may be explained by Shockley partial dislocation motion under compressive stress. A remarkable hardness of ~10 GPa was determined for these coatings. The presence of nanotwins in these coating may account for the …
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Control of Microstructure and Texture in Nanocrystalline Transition -Metal Nitride Coatings by Ion Beam Assisted Deposition Method
In this study, titanium nitride (TiN), chromium nitride (CrN) and vanadium nitride (VN) were prepared by ion-beam-assisted deposition method (IBAD). The film microstructure was observed using scanning electron microscopy (SEM). The results showed that the microstructure was controlled by homologous …
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Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
The group IV-B transition metal nitride TiN is widely employed as a wear-resistant coating on mechanical components and as a diffusion barrier in microelectronic devices. I use the epitaxial growth of single crystal TiN as a model system for insight on the evolution of surface morphology and …
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Catalysis over molybdenum containing nitride materials
… explores the reactivity of bulk and supported transition metal nitride catalysts, with particular emphasis on the possible reactivity of lattice nitrogen within bulk nitride catalysts. The experimental work has focussed on two main objectives: determining the most active transition metal …
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Effect of low energy ion irradiation during growth on the composition, nanostructure, and physical properties of epitaxial metastable zirconium aluminum nitride
Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2012-10-15T19:00:24Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Master Dissertation.pdf: 23101363 bytes, checksum: c35d98278c93a599d3b071276046859a (MD5)
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Process property relations in reactively sputtered transition metal compounds
… the process parameters and the properties of transition metal compound thin films grown by reactive magnetron sputtering techniques are investigated. In the first part, the effect of energetic species, which are generated by backscattering of plasma ions at the target, on the growth and the …
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Low-temperature protonation studies of transition metal alkyl complexes and the synthesis and characterization of early transition metal PCP pincer complexes and two-coordinate alkylamido complexes
… pincer ligand and M is a group 10 transition metal. Complexes where R is isopropyl were prepared with nickel, palladium, and platinum. Additionally, complexes where R is t-butyl or adamantyl were prepared for nickel. Protonation of these complexes with HOTf in CDCl2F did not afford …
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Co-reactant interactions with CVD surfaces: Activation or passivation of growth
… a new route to achieve atomic layer etching of metals. The conformal deposition of highly conductive or superconductive transition metal nitride thin films is technologically important for a wide range of applications. For early transition metal nitrides, reaction of dialkylamido precursors and …