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Showing 1 to 1 of 1 for “"source debris"”.
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Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources
… excimer laser lithography by reducing the light source wavelength from 195nm down to a 13.5nm ± 0.2 nm. This shift allows for an increase in resolution without the traditional consequences of a reduced depth of focus. Such a drastic reduction in wavelength is not without any technological …