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Showing 1 to 1 of 1 for “"sicf"”.
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Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition
… Fluorocarbon films containing silicon (SiCF) have been developed in this work for low-k interlayer dielectric applications below 50 nm linewidth technology. The films were prepared by plasma enhanced chemical vapor deposition (PECVD) using gas precursors of tetrafluoromethane as the …