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Showing 1 to 20 of 66 for “"secondary electron"”.

  1. Secondary Electron Emission of Liquid Insulators

    Made available in DSpace on 2014-12-08T22:24:45Z (GMT). No. of bitstreams: 1 7013299.pdf: 2113801 bytes, checksum: 73ae609c90132eab607f6518c534e29f (MD5) Previous issue date: 1969

    uiuc Repository record for Secondary Electron Emission of Liquid Insulators (opens in a new tab)

  2. Secondary Electron Multiplication in Microwave Field

    Made available in DSpace on 2014-12-04T21:03:08Z (GMT). No. of bitstreams: 1 5904508.pdf: 3943748 bytes, checksum: f4e0e3ce8238eb913d3c9046730729ea (MD5) Previous issue date: 1959

    uiuc Repository record for Secondary Electron Multiplication in Microwave Field (opens in a new tab)

  3. The Time Dispersion of Secondary Electron Emission

    Made available in DSpace on 2014-12-04T21:02:43Z (GMT). No. of bitstreams: 1 0011504.pdf: 4327321 bytes, checksum: 243e5582e982761d86a45d5e21eb4e49 (MD5) Previous issue date: 1955

    uiuc Repository record for The Time Dispersion of Secondary Electron Emission (opens in a new tab)

  4. Encapsulated source contact dose estimates incorporating secondary electron emission

    Secondary electron emission generated at the surface of thin material from interaction with gamma rays form a significant component of the surface dose. The intensity of this emission is known to vary with material composition and incident radiation energies. The goal of this research effort is to …

    uoit Repository record for Encapsulated source contact dose estimates incorporating secondary electron emission (opens in a new tab)

  5. SECONDARY ELECTRON SPECTROSCOPY INSIDE THE SCANNING ELECTRON MICROSCOPE AND ITS MATERIAL SCIENCE APPLICATIONS

    The scanning electron microscope (SEM) is a powerful high resolution imaging instrument used in multiple fields of study today. The low energy scattered electrons inside it, used mainly for topographic image of a sample’s surface, contain valuable information in the emitted energy spectrum. In this …

    nus Repository record for SECONDARY ELECTRON SPECTROSCOPY INSIDE THE SCANNING ELECTRON MICROSCOPE AND ITS MATERIAL SCIENCE APPLICATIONS (opens in a new tab)

  6. Measurements of Secondary Electron Yield from Low-Energy Ion Interactions With Gas Covered Surfaces

    Made available in DSpace on 2017-07-06T18:48:38Z (GMT). No. of bitstreams: 3 Hu_Bozhao_MS.pdf: 99116701 bytes, checksum: 67272fada3cf5d1c798b37d3a385c992 (MD5) Hu_Bozhao_MS_ABS.pdf: 638832 bytes, checksum: 6a854d3d50627da8e1f9a753adec3096 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record for Measurements of Secondary Electron Yield from Low-Energy Ion Interactions With Gas Covered Surfaces (opens in a new tab)

  7. Theoretical and experimental secondary electron spin polarisation studies and 3D theory of field emission for nanoscale emitters

    Spin-polarised electron beams are an invaluable probe of spin-dependent phenomena in fields of atomic and molecular physics, magnetism and biophysics. For this purpose, this work explores both theoretical and experimental aspects of field emission properties of point-like nano-scale emission …

    cambridge Repository record for Theoretical and experimental secondary electron spin polarisation studies and 3D theory of field emission for nanoscale emitters (opens in a new tab)

  8. Interaction cross sections needed for simulation of secondary electron emission spectra from thin metal foils after fast proton impact

    Monte Carlo simulations of secondary electron emission from thin metal foils after fast proton impact require reliable interaction cross sections with the target under consideration. Total and energy differential inelastic cross sections have been derived for aluminum, copper, and gold thin-metal …

    ecu Repository record for Interaction cross sections needed for simulation of secondary electron emission spectra from thin metal foils after fast proton impact (opens in a new tab)

  9. A Study of High Energy-Resolution and at Low Primary Energies of the Secondary Electron Emission From (100) Tungsten

    Made available in DSpace on 2015-05-12T21:41:39Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 6706698.PDF: 3471754 bytes, checksum: 55771bb48e63d8dd7ed8d16ef08a4168 (MD5) Previous issue date: 1966

    uiuc Repository record for A Study of High Energy-Resolution and at Low Primary Energies of the Secondary Electron Emission From (100) Tungsten (opens in a new tab)

  10. Examination of secondary electrons generated by encapsulated gamma sources to improve contact dosimetry estimates

    Secondary electron generation on the surface of encapsulated gamma sources can play a large role in the dose measured near the surface of the encapsulation. The National Council on Radiation Protection and Measurements (NCRP) Report - 40 contains contact dose rate conversion factors for …

    uoit Repository record for Examination of secondary electrons generated by encapsulated gamma sources to improve contact dosimetry estimates (opens in a new tab)

  11. Anode Materials for High Power Microwave Devices

    … HPMs can significantly upset or even destroy electronic devices within military and commercial systems prompting applications for nonlethal directed energy weaponry. Cathodes and anodes are the two critical components and the engine of the HPM which makes this application possible. The decay …

    cambridge Repository record for Anode Materials for High Power Microwave Devices (opens in a new tab)

  12. Radio frequency driven direct current electron beam source

    A new type of electron beam source employing ion-induced secondary electron emission from cold cathodes is developed for feature charge neutralization during plasma etching. A low pressure (approximately 2 – 20 mTorr) inductively coupled plasma provides ions which impinge on a high secondary

    colostate Repository record for Radio frequency driven direct current electron beam source (opens in a new tab)

  13. Observation of plasma sheath modulation in the plasma bipolar junction transistor

    … model developed herein, a 359% increase in the secondary electron emission coefficient of the exposed silicon surface is inferred. Additionally, the pressure dependence of these devices is explored, with the data suggesting that smaller devices would exhibit both faster switching and higher …

    uiuc Repository record for Observation of plasma sheath modulation in the plasma bipolar junction transistor (opens in a new tab)

  14. Emitting Wall Boundary Conditions in Continuum Kinetic Simulations: Unlocking the Effects of Energy-Dependent Material Emission on the Plasma Sheath

    … the plasma sheath forms and regulates the electron and ion fluxes into the material. Emission from the material has the potential to change sheath structure drastically, and must be modeled rigorously to produce accurate predictions of the fluxes into the wall. Continuum kinetic codes offer …

    vt Repository record for Emitting Wall Boundary Conditions in Continuum Kinetic Simulations: Unlocking the Effects of Energy-Dependent Material Emission on the Plasma Sheath (opens in a new tab)

  15. Low-voltage spatial-phase-locked scanning-electron-beam lithography

    Spatial-phase-locked electron-beam lithography (SPLEBL) is a method that tracks and corrects the position of an electron-beam in real-time by using a reference grid placed above the electron-beam resist. In this thesis, the feasibility of spatial-phase-locked lowvoltage electron-beam lithography is …

    mit Repository record for Low-voltage spatial-phase-locked scanning-electron-beam lithography (opens in a new tab)

  16. The Effects Of Electrode Geometry On Current Pulse Caused By Electrical Discharge Over An Ultra-fast Laser Filament

    … We attribute these additional features to secondary electron collisional ionization brought about by field enhancement at the tips. Additional discrepancies in the currents measured leaving the high-voltage electrode and that returning to ground were also observed. Implications for …

    ucf

  17. Ion flux maps and helicon source efficiency in the VASIMR VX-100 experiment using a moving Langmuir probe array

    … to pulse in an effort to find optimal settings. Secondary electron emission was found to be an important factor that artificially enhanced the measured flux at large negative bias voltages. The most accurate bias voltages were found to be around -20 volts where the flux enhancing effects were …

    rice Repository record for Ion flux maps and helicon source efficiency in the VASIMR VX-100 experiment using a moving Langmuir probe array (opens in a new tab)

  18. Monte Carlo Simulations of Electron Transport in 3D Solids and Molecular Dynamics Simulations of the Mechanics of 2D materials

    The aim of this thesis is the study of electronic transport and mechanical properties of materials using computer simulations. In particular, we dealt with the charge transport in semiconduc- tor and metallic samples and with the peeling of a graphene layer from bulk graphite. The computational …

    trento Repository record for Monte Carlo Simulations of Electron Transport in 3D Solids and Molecular Dynamics Simulations of the Mechanics of 2D materials (opens in a new tab)

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