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Showing 1 to 20 of 22 for “"reactive magnetron sputtering"”.
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An Investigation of Target Poisoning during Reactive Magnetron Sputtering
… so called "target poisoning" during magnetron deposition of TiN in an Ar/N2 atmosphere. Investigations include realtime in-situ ion beam analysis of nitrogen incorporation at the Ti sputter target during the deposition process and the analysis of particle uxes towards and from the …
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Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
… Epitaxial TiN layers are grown on MgO(001) by reactive magnetron sputter deposition in pure N$\sb2$ at $\rm650<T\sb{s}<750\sp\circ$C. Without energetic ion bombardment, scanning tunneling microscopy (STM) results show that the development of surface morphology is dominated by growth mounds with …
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Nucleation Kinetics During Homoepitaxial Growth of Titanium Nitride(001) by Reactive Magnetron Sputtering
… TiN layers grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large …
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Growth and properties of hydrogenated amorphous silicon carbon alloys by DC reactive magnetron sputtering
… (a-Si$\rm\sb{1-x}C\sb{x}$:H) alloy films by dc reactive magnetron sputtering (RMS) of a silicon target in a plasma of (Ar + H$\rm\sb2$ + CH$\sb4).$ Films with optical bandgaps of 1.8-2.0 eV and x $\le$ 0.2 have a compact microstructure; no CH$\rm\sb{x}$ groups are detected by their stretching …
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Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system
Deposition of thin film using plasma sputtering system had been widely discovered and developed extensively for many years in technological and industrial process especially formation of titanium nitride (TiN) films due to its high hardness, good wear resistance, low friction coeffcient and …
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Physical properties of thin film, metastable titanium(0.5)aluminum(0.5)nitrogen alloys deposited by reactive magnetron sputtering
… deposited on stainless-steel substrates by d.c. reactive magnetron sputtering. The effects of low-energy (E $\leq$ 250 eV) ion bombardment during deposition on thin film microstructure, oxidation properties, and optical reflectance of the metastable alloy were evaluated.
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In situ spectroscopic ellipsometry studies of silicon film crystallinity and interface structure deposited by DC reactive magnetron sputtering
… (SE) studies on silicon film growth by reactive magnetron sputtering of a Si target in (Ar + H$\sb2$) at low temperatures ($\le$600$\sp\circ$C). The complete crystalline film growth zones have been identified for the first time.
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Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering
… (HfN) films deposited by off-normal incidence reactive magnetron sputtering at room temperature in N2/Ar mixtures. Texture measurements were performed by x-ray pole figure analysis of the (0002) (AlN), (111) and (200) (TiN and HfN) diffraction peaks. We report a strong dependence of fiber …
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Optimization of the reactive magnetron sputter deposition, and studies of hydrogen diffusion in hydrogenated amorphous silicon based materials
… To improve these properties, I have chosen the reactive magnetron sputtering method for the growth of a-Si:H and its doped alloys. The advantages of this technique are the independent control of hydrogen incorporation via the pressure of H$\sb2$ injected into the plasma, and the energetic nature …
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Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical …
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A real-time study of hydrogenated amorphous silicon, microcrystalline silicon, and amorphous silicon carbide growth by optically enhanced infrared reflectance spectroscopy
… $\rm (a-Si\sb{1-x}C\sb{x}$:H) thin films by reactive magnetron sputtering. Complimentary information about the film microstructure is obtained from real time spectroscopic ellipsometry measurements.
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Towards stimuli-responsive functional nanocomposites: smart tunable plasmonic nanostructures Au-VO2
… thin films by the inverted cylindrical reactive magnetron sputtering (ICMS) known as hollow cathode magnetron sputtering for the first time and report the reversible tuning of surface plasmon resonance of Au nanoparticles by only adjusting the external temperature stimuli. The …
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Fundamental processes in growth of reactive DC magnetron sputtered thin films
… understanding of fundamental processes in DC reactive magnetron sputtering of optical functional coatings. From a comparative study for different metal-oxygen combinations, which is illustrated by two oxide deposition reports on neighbouring elements - hafnium and tantalum, a surprising …
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Carbon Nitride and Conjugated Polymer Composite Materials
… carbon nitride (CNx) thin films prepared using a reactive magnetron sputtering technique were investigated both individually and as composites with the organic conjugated polymers polybithiophene (PBT) and poly(3-hextlthiophene) (P3HT). At low nitrogen content, the film structure was dominated by …
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Synthesis and characterization of tungsten oxide wo3 nanostructures thin films for gas sensing applications
… was carried out using a direct current (DC) reactive magnetron sputtering at different deposition temperatures (300, 400 and 500 ºC). The deposition time, pressure, power, oxygen and argon flow rates were kept constant. The purpose of this work was to investigate the effect of deposition …
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Growth and Characterization of Epitaxial Oxide Thin Films
… doping the film with Na. Films were deposited by reactive magnetron sputtering at various temperatures on single crystal SrTiO3 (100) and R-sapphire substrates. X-ray diffraction studies showed that the optimised films were highly (001) oriented, quality of epitaxy improving with decreasing …
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Synthesis and characterisation of hybrid Zn0-carbon nanostructures for potential applications in hydrogen storage
… NPs) was carried out using direct current (DC) reactive magnetron sputtering at different deposition times, pressure and temperature, and were used as a seeding in the synthesis of ZnO nanorods (NRs). Using the hydrothermal process, vertically aligned ZnO NRs were grown on different seed …
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Novel materials for magnetic tunnel junctions
… structures have successfully been fabricated by reactive magnetron sputtering. Extraordinarily high TSP values were found of up to 74% and 85% for Fe/MgO and Co70Fe30/MgO junctions, respectively. These values are much higher than those in otherwise identical STS devices but with amorphous Al2O3 …
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Synthesis and characterization of Titanium Nitride Nanowires for neural-electrode coatings for improving electrode/neuron interface in the brain
… film, grown through Radio Frequency (RF) non-reactive magnetron sputtering, was used as a seeding layer for the growth of NWs. The properties of the seed layer and the grown NWs were studied by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-Ray diffraction (XRD), Raman …
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Synthesis and characterization of metal oxide semiconductors for photoelectrochemical hydrogen production
… prepared by using radio- frequency (RF) reactive magnetron sputtering for photoelectrochemical (PEC) applications. Metal-oxide thin films as a photoelectrode are of special interest for PEC systems to produce hydrogen in an aqueous solution by solar energy due to their low cost and …
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