Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 14 of 14 for “"reactive ion etch"”.
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Transport and Agglomeration of Dust Contaminant Particles in Reactive Ion Etch Reactors
… was also found to be dependent on plasma conditions. Agglomerates generally grow either in a diffusive or ballistic manner. Neutral gas flow in the reactor has been found to be a useful means of controlling contamination. Higher flow rates can sweep dust particles away from sensitive areas of …
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Predictable Reactive Ion Etching of Gallium-Arsenide and Aluminum - Gallium-Arsenide in Hydrogen-Chloride/argon Radio Frequency Discharges
The reactive ion etch rate of GaAs in HCl/Ar discharges has been studied as a function of RF power, gas mixture, and applied bias. The bias voltage, defined as the difference between the substrate and the time averaged plasma floating potentials, was found to best predict the etch rate. The etch …
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Microstructured tungsten thermophotovoltaic selective emitters c by Natalija (Zorana) Jovanović.
This research investigates the fabrication, modeling, characterization, and application of tungsten two-dimensional (2D) photonic crystal (PhC) structures as selective emitters and means of achieving higher efficiencies in thermophotovoltaic (TPV) energy conversion systems. Important aspects of the …
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Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma
Stencil masks are used to print ultra-high resolution patterns using helium ion/atom beam lithography and are often manufactured from thin, free-standing silicon nitride membranes. The masks have sub-200nm openings etched through the thickness of the membrane using a reactive ion etch (RIE) process …
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Fabrication of Three-Dimensionally Independent Microchannels Using a Single Mask Aimed at On-Chip Microprocessor Cooling
A novel fabrication process is presented which allows for three-dimensionally independent features to be etched in silicon using SF6 gas in a deep reactive ion etcher (DRIE) after a single etch step. The mechanism allowing for different feature depths and widths to be produced over a wafer is …
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An electrothermally-actuated bistable MEMS relay for power applications
… combined with transient electrothermal actuation and contact structure to develop a MEMS relay for power switching. The relay components, fabricated by a through etch of a silicon wafer using deep reactive ion etch (DRIE), move laterally in the plane of the wafer. The synthesis, analysis, …
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Analysis of DRIE uniformity for microelectromechanical systems
… model capturing pattern density effects in Deep Reactive Ion Etch (DRIE), which are important in MEMS, is presented. Our previous work has explored the causes of wafer-level variation and demonstrated die-to-die interactions resulting from pattern density and reactant species consumption. Several …
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Three-Dimensional Passivated-Electrode Insulator-Based Dielectrophoresis (3D-PiDEP)
The focus of this research is the isolation of waterborne pathogens which are one of the grand challenges to human health, costing the lives of about 2.5 million people worldwide each year. The aim was to develop new microfluidic techniques for selectively concentrating and detecting waterborne …
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Novel materials for silicon based photonics
… silicon alone cannot realize all the above mentioned functions. The development of silicon photonics has found its way through exploiting novel materials as hybrid platforms to manufacture various devices and systems. In this thesis, we focus on the development of novel material in emerging …
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Droplet behavior on superhydrophobic surfaces: Interfaces, interactions, and transport
… understand the dependence of interfacial interaction mechanisms on surface morphology. ^ A detailed understanding of the dynamics of droplet response to an applied electric field is essential for implementation of electrowetting techniques in various devices. In the first part of the thesis, a …
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Reliability and processing of ferroelectric thin film capacitors with emphasis on fatigue and etching
… by a reversible spontaneous polarization in the absence of an electric field. The characteristic polarization response of a ferroelectric material to an applied electric field enables a binary state device in the form of a thin film ferroelectric capacitor that can be used to store …
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Graphene etch mask for silicon
… will be explored. Graphene, a popular two-dimensional material of remarkable electrical properties, has been thought to be a successor to current day microelectronic materials. With the many challenges posed by the manufacture of conventional devices from graphene, other adaptations for its …
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Fabrication of high-throughput critical-angle X-ray transmission gratings for wavelength-dispersive spectroscopy
The development of the critical-angle transmission (CAT) grating seeks both an order of magnitude improvement in the effective area, and a factor of three increase in the resolving power of future space-based, soft x-ray spectrometers. This will enhance further studies of the universe's make-up, …
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From high power terahertz quantum cascade lasers to terahertz light amplifiers
… [mu]m), despite having many potential applications, is technologically relatively underdeveloped mainly because of the lack of suitable coherent radiation sources when compared with nearby electromagnetic radiation spectrum. The invention of the THz quantum cascade laser, a …