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Showing 1 to 20 of 31 for “"pulsed plasma"”.
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High-Efficiency Soft-Switched Pulsed Plasma Bias Supply System
… play a crucial role as bias voltage sources in plasma-enhanced semiconductor manufacturing processes. Employing pulsed waveforms to generate plasma offers significant improvements in manufacturing precision. However, producing these waveforms is challenging due to the need for high voltages …
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A mechanism to accelerate the late ablation in pulsed plasma thrusters
Pulsed Plasma Thrusters (PPTs) are long standing electric propulsion thrusters that are reliable, relatively simple and low cost. One of the main issues with the PPT is its poor utilization of the propellant and low efficiency. Typically only 40-60% of the propellant contributes to the production …
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RF-compensated Langmuir Probe Diagnostics of Pulsed Plasma Ion Implantation System
… of ion implantation dose in processing plasmas. The vital variable is fluence, i.e. ion implantation dose, which is currently predicted by Lieberman model during high-voltage Plasma Ion Implantation (PII). Chapter \ref{chap:intro} starts with an introduction of plasma ion implantation. …
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Propellant Surface Temperature and Plume Characteristics of Micro-Pulsed Plasma Thrusters
The micro-Pulsed Plasma Thruster is a device capable of supplying discrete impulses for propulsive maneuvering of small satellites. These devices suffer from low propellant utilization related to late-time propellant ablation, causing a drop in specific impulse and thruster efficiency. The exhaust …
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Developing a space shuttle experiment for Hall and pulsed plasma thrusters
Very little data on Hall and Pulsed Plasma Thrusters has been taken in the hard vacuum of space. The Environment Effects Verifatication experiment is designed to take archival-quality data in space in the plume and far-field regions of these thrusters. Student involvement is a key element of the …
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Development of high energy pulsed plasma simulator for plasma-lithium trench experiment
… liquid lithium infused trench (LiMIT) device, a pulsed plasma source utilizing a theta pinch in conjunction with a coaxial plasma accelerator has been developed. An overall objective of the project is to develop a compact device that can produce 100 MW/m2 to 1 GW/m2 of plasma heat flux (a typical …
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Pulsed plasma enhanced and pyrolytic chemical vapor deposition of fluorocarbon biopassivation coatings
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1997.
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Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications
As semiconductor feature sizes decrease and feature density increases, the industry is facing the increasing challenge of finding materials that can meet the stringent demands of the next generation of devices. One of the most intense, as well as diverse, fields of research has been in the area of …
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Characterization of ion properties in a linear pulsed plasma-material interaction test stand
… divertor regions of the magnetically confined plasma, tokamaks experience off-normal events in which high intensities of heat flux incident on wall component surfaces result in intolerable levels of damage. Proposed solid divertors will not be able to withstand these fluxes, especially in …
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Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.
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Control of supersonic axisymmetric base flows using passive splitter plates and pulsed plasma actuators
… energy deposition from multiple electric-arc plasma discharges placed around the base. The flow-control authority of both methodologies was evaluated with experimental diagnostics including particle image velocimetry, schlieren photography, surface flow visualization, pressure-sensitive paint, …
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Pulsed plasma microjets: a new tool for the investigation of plasma kinetics and molecular spectroscopy
… the expansion process. By integrating a microplasma device with a supersonic nozzle, temperatures as low as 50 K were achieved for molecules having lifetimes shorter than 40 ns and excitation (internal) energies ≳ 11 eV. Additionally, final temperatures ranging from 90 K to 900 K for a set of …
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Design and construction of a diagnostic suite for fundamental studies of pulsed plasma enhanced chemical vapor deposition
Includes bibliographical references (pages 65-68).
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Nearly Monoenergetic Positive Ion Beam with Self-Neutralized Space Charge Extracted from a Pulsed Plasma and Its Application
… neutralization of an ion beam extracted from a plasma is crucial for advanced plasma processes which require precise control of the ion flux and the width of the ion energy distribution (IED). In previous studies, filaments thermionically emitting electrons were used for neutralizing the space …
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Characterization of a green electric solid propellant for electric propulsion
… are also being considered for use in ablative pulsed plasma thruster and multimode systems. In this work, the behavior and performance of a novel green electric solid propellant operating in an electrothermal ablation-fed pulsed plasma thruster was investigated. Using an inverted pendulum …
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Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics
Organosilicon thin films deposited by pulsed plasma-enhanced chemical vapor deposition (PPECVD) and hot-filament chemical vapor deposition (HFCVD) were investigated as potential biopassivation coatings for neural probes. It was found that organosilicon films from identical precursors differ in …
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Liquid repellent surfaces
… have certain disadvantages, however employing plasma technology may provide a route for many novel "multi-functional effects" fabrics such as repellency against toxic chemical agents. In order to produce repellent coatings the surface must have a low surface energy. To obtain this, inert …
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Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications
Pulsed plasma enhanced and hot filament chemical vapor deposition have produced fluorocarbon films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Solid-state nuclear magnetic resonance spectroscopy was demonstrated as a valuable film …
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Multi-scale modeling of nanosecond plasma assisted combustion
… a comprehensive understanding of nonequilibrium plasma effects (in situ generation of reactive species and radicals combined with gas heating) on the combustion process is still lacking. Over the past decade, research efforts have advanced our knowledge of electron impact kinetics and low …
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Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics
Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Both diethylsilane and octamethylcyclotetrasiloxane precursors were used, with oxygen and hydrogen peroxides …
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