Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 15 of 15 for “"plasma etch"”.
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Virtual metrology for plasma etch processes.
Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis …
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Physics-Informed Deep Learning for Plasma Etch Optimization
Modeling the plasma etch process is highly valuable in the field of semiconductor manufacturing. This intricate process relies on the execution of numerous individual processes, numbering in the hundreds to thousands. The application of artificial intelligence (AI) and machine learning (ML) …
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Real time interferometric imaging of the plasma etch process
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.
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Characterization and modeling of plasma etch pattern dependencies in integrated circuits
… model capturing pattern dependent effects in plasma etching of integrated circuits (ICs) is presented. Plasma etching is a key process for pattern formation in IC manufacturing. Unfortunately, pattern dependent non-uniformities arise in plasma etching due to microloading and RIE lag. This …
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Characterization and modeling of dry etch processes for titanium nitride and titanium films in Cl₂/N₂ and BCl₃ plasmas
… meet the ever-shrinking dimensions. The gaseous plasma assisted etching is one of these revolutionary processes. However, the plasma and the etch process are very complex in nature. It has been very difficult to understand various species present in the plasma and their role in the etch reaction. …
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Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes
… sizes on semiconductor chips continue to shrink plasma etching is becoming a more and more critical process in achieving low cost high-volume manufacturing. Due to the highly complex physics of plasma and chemical reactions between plasma species, control of plasma etch processes is one of the …
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Etching of Gallium Arsenide with atomic hydrogen
… used to make in-situ observations of continuous etching of the (100) GaAs surface during exposure to a known concentration of thermalised hydrogen atoms downstream from an H₂ plasma. Etch rates between 3 and 9 nm/min are followed at constant temperature within the range 229 - 360 °C. Increasing …
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Anomaly detection in semiconductor manufacturing through time series forecasting using neural networks
… forecasting is carried out with application to a plasma etch case study. The study is performed on three predictive models with increasing complexity for comparison. The three models are namely: Autoregressive Integrated Moving Average (ARIMA), Multi-Layer Perceptron (MLP) and Long Short Term …
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Multivariable analysis of spectral measurements for the characterization of semiconductor processes
… characterizing endpoint for two key processes: plasma etch and chemical mechanical polishing (CMP). To extract meaning information in real-time from the volumes of acquired optical sensor data, chemometric methods including principal component analysis (PCA) and partial least squares (PLS) are …
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Multilevel interference lithography--fabricating sub-wavelength periodic nanostructures
… In addition, an image-reversal process with plasma etch trimming was developed to control the linewidth of each grating level to nanometer-repeatability. Extensive optical simulations using rigorous coupled-wave analysis were used to examine the intensity distribution of exposures over …
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Three-Dimensional Passivated-Electrode Insulator-Based Dielectrophoresis (3D-PiDEP)
… The core process of the technique is the etching of 3D structures in silicon with a single plasma etch utilizing an effect known as reactive ion etch lag (RIE lag). Using this unique process, 3D devices are fabricated in both silicon and the polymer polydimenthylsiloxane (PDMS). Using both …
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Fabrication of high-throughput critical-angle X-ray transmission gratings for wavelength-dispersive spectroscopy
… were done with wet potassium hydroxide (KOH) etching of silicon. This process successfully fabricated small areas of grating and enabled a successful demonstration of the soft x-ray diffraction efficiency. However, the open-area fraction was limited to below 20 percent for four micron-tall CAT …
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Plasma Processing of Superconducting Radio Frequency Cavities
<p>The development of plasma processing technology of superconducting radio frequency (SRF) cavities not only provides a chemical free and less expensive processing method, but also opens up the possibility for controlled modification of the inner surfaces of the cavity for better superconducting …
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High power superluminescent light-emitting diodes
… driven SLED arrays. An inductively coupled plasma etch was developed to provide smooth, angled sidewalls for the integrated GaN turning mirror. Further work should be done to develop a suitable package for the device to dissipate the heat generated and allow for higher duty cycles and CW …
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Laser-enhanced plasma etching of semiconductor materials
In this work, laser exposure was coupled with plasma etch processes for local etch rate enhancement, and under some conditions, etch activation. Materials were tested which are most-frequently used in semiconductor devices – namely Si, SiO2, and Cu. A 100 Hz, 7 ns pulse width Q-switched Nd:YAG …