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Showing 1 to 2 of 2 for “"plasma assisted cleaning"”.

  1. Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing

    Made available in DSpace on 2017-07-06T18:55:12Z (GMT). No. of bitstreams: 3 Lytle_Wayne_M_MS.pdf: 27922220 bytes, checksum: 67faae2239adf87cba4f0a7f443a8456 (MD5) Lytle_Wayne_M_MS_ABS.pdf: 35267 bytes, checksum: 25efd85c0e399395e1a5a857fbd3a791 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record for Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing (opens in a new tab)

  2. Removal of organic contaminants from lithographic materials

    … organic contamination on the mask. Traditional cleaning methods employ the use of wet chemicals to etch contamination off of a surface, however this is limited in the sub-micron range of contaminant particles due to lack of transport of sufficient liquid chemical to the surface in order to …

    uiuc Repository record for Removal of organic contaminants from lithographic materials (opens in a new tab)