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Showing 1 to 20 of 112 for “"photoresist"”.
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Salty development of an optical photoresist
In this series of experiments, we add salt to a photoresist developer and observe the effect on photoresist contrast. In order to measure contrast, we designed an anti-reflection coating stack to reduce reflections between the photomask and the photoresist. After development, we observe that for …
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Understanding molecular scale effects during photoresist processing
The dimensional tolerances of photoresist features are now at the nanometer scale, where effects of individual molecules are important. In recognition of the industrial need for a molecular-scale understanding of photoresist performance, mechanistic models have been developed for each of the …
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Mesoscale simulation of the photoresist process and hydrogel biosensor array platform indexed by shape
… these issues, a first-principles “mesoscale” photoresist simulator was devised by past researchers, and further developed by the author. A base quencher model was added to help elucidate the effects of base on LER. Quantum mechanical estimation techniques were used to calculate more accurate …
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Reduction of Line Edge Roughness in Semiconductor Photoresist by Means of a Grazing Incidence Ion Beam
… efforts are underway to decrease LER from the photoresist, post-develop smoothing techniques may be required to continue shrinking chip features economically. This work reports on one such method employing the use of an ion beam at grazing incidence along the features. This method smooths …
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Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography
… is the deposition of a thin and uniform layer of photoresist (often called resist) on which the lithographic image is exposed. Typical photoresist layers are less than 1 pum thick with a variation of 5 [angstroms] for advanced chips. Spin coating is the prevalent coating method to produce the …
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Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition
… millions of individual circuit features into a photoresist. Optical pattern generators have been developed that increase exposure throughput using multiple beams of light. Photoresist materials and processes are sought that will enable higher resolution imaging for current optical pattern …
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Interfacial Electrochemistry and Surface Characterization: Hydrogen Terminated Silicon, Electrolessly Deposited Palladium & Platinum on Pyrolyzed Photoresist Films and Electrodeposited Copper on Iridium
… Thin carbon films can be formed by spin coating photoresist onto silicon substrates and pyrolyzing at 1000 degrees C under reducing conditions. This work also shows that the electroless deposition of palladium and platinum may be accomplished in hydrofluoric acid solutions to attain palladium and …
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Determining the root causes of excess metal and void defects with respect to the photoresist quality in thin film PZT fabrication processes
Thesis (M. Eng. in Manufacturing)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2012.
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Double-Exposure Gray-Scale Photolithography
Three-dimensional photoresist structures may be realized by controlling the transmitted UV light intensity in a process termed gray-scale photolithography. Light modulation is accomplished by diffraction through sub-resolution pixels on a photomask. The number of photoresist levels is determined by …
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A study of solvent-rich environments for evaporation rate control in the extrusion spin coating process
… process is the deposition of a thin coating of photoresist from which the lithographic mask is made. The photoresist layer is typically 1 [micro]m thick with a thickness variation of less than 25[angstroms] (within 3[sigma]). The current industrial process of spin coating can achieve these …
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Fabrication and qualification of arbitrarily patterned seamless tooling for continuous roll-to-roll microcontact printing
… The manufacturing process window of AZ 9260 photoresist was examined through numerical simulation and experimentation to determine an input set for the most robust performance and ideal tool feature geometry. A rasterscan protocol was developed to arbitrarily pattern the photoresist in a …
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Design and Fabrication of Electrostatically Actuated Serpentine-Hinged Nickel-Phosphorous Micromirror Devices
… In particular, the process makes use of thick photoresist layers as a sacrificial mold into which an amorphous nickel-phosphorous alloy may be deposited. Ideal design of the electrostatically actuated micro-mirrors was investigated, and a final design was selected and modeled using FEA …
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Photolithography and surface modification applications of a 172 nanometer xenon microplasma excilamp
… lamp has been utilized in defining patterns on a photoresist. The mechanism by which the lamp works is different from conventional methods as the photoresist is removed at a rate of 3.3 nm/s from the substrate and no development is required. This technique thus has the merit of reduced cost of …
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Theory, Design, and Fabrication of Diffractive Grating Coupler for Slab Waveguide
… recording the interference between two waves in photoresist. The waveguide is fabricated from silicon nitride that is deposited by chemical vapor deposition. The diffraction grating recording assembly is described along with the grating coupler fabrication process. A grating coupler is fabricated …
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Feature profile evolution during the high density plasma etching of polysilicon
… of plasma etching experiments were performed on photoresist masked and silicon oxide-masked polysilicon samples using C12 and HBr chemistries varying the inductive power (controls the ion density, radical concentrations), the rf biasing power (controls the ion energy) and the gas flowrate …
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Additive Lithography Fabrication And Integration Of Micro Optics
… masks and controlled partial exposures to sculpt photoresist into the desired optical surface relief profile. We explore various masking schemes for fabricating a variety of optical elements with unprecedented flexibility and precision. These masking schemes used in conjunction with the additive …
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Fabrication and Characterization of Three Dimensional Photonic Crystals Generated by Multibeam Interference Lithography
… optimization of the optical setup and the photoresist initiation system leads to a significant improvement of the optical quality of the crystal, as characterized by normal incidence optical spectroscopy. Theoretical spectra are calculated and demonstrate close agreement with experimental …
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Grafeno ant skandžio oksido fotolitografija /
… beam epitaxy. After the wet transfer, a photoresist mask was formed on the surface, following which the monolayer was dry etched inside an oxygen plasma chamber to form a graphene microstructure. Another photoresist mask was formed so that a nickel-gold metal layer could be deposited on …
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Scaleable nanomanufacturing of metasurfaces using microsphere photolithography
… collimated light to nanoscale photonic jets in a photoresist layer. This dissertation investigates the fabrication capabilities, process control, and potential applications of MPL. First, the MPL concept is applied to the fabrication of metasurfaces with engineered IR absorption (e.g. perfect …
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