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Showing 1 to 4 of 4 for “"oxygen discharge"”.
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Characterization of PET samples processed in an RF oxygen discharge
… (PET) sample. The plasma was generated in a pure oxygen process atmosphere at pressures of 100 mTorr, and 2.0 Torr at output powers of 250 Watts and 500 Watts.</p> <p>Optical emission spectroscopy (OES) was used to characterize the plasma/sample interaction. Spectra were measured from 250 nm to …
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Dry etching processes for ferroelectric capacitors
… rf power of 200W in Or<sub>2</sub>-2.5% CF3CFH2 discharge. RuO<sub>2</sub> films were successfully patterned under these conditions using SiO<sub>2</sub> as the etch mask. The etching mechanism was investigated from a scientific aspect. Several impurity gases, such as N<sub>2</sub>, …
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Modeling and Analysis of Plasma-Assisted Etching Reactor Phenomena
… as the state of the plasma, for the case of the oxygen discharge. Important dimensionless system parameters were identified and their effect on etch rate, degree of etch anisotropy and uniformity was examined. The model predictions agreed with experimental data on etch rate of photoresist in an …