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Showing 1 to 2 of 2 for “"neutral debris"”.
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Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources
… One such hurdle is the existence of energetic debris emitted by the dense warm plasmas (~1019cm-3, ~30 eV) used to create the EUV light. EUV’s high absorbance into most known materials prevents the traditional use of a pellicle to protect the collection optics, which reflect the produced light …
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Cleaning of tin debris by reactive ion etching in a discharge-produced EUV plasma source
… the light generation process, energetic ions or neutral debris are emitted from the plasma in addition to the desired light. The contamination by such debris will critically affect the life time of the mirror as well as the total light output. The contamination by debris is more serious when …