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Showing 1 to 8 of 8 for “"n-type conductivity"”.

  1. Layer disordering and aluminum-gallium interchange in aluminum-gallium arsenide - gallium-arsenide quantum well heterostructures

    … and annealed, and for crystals converted to n-type conductivity by high-temperature Si diffusion or by Si$\sp+$ ion implantation and annealing.

    uiuc Repository record for Layer disordering and aluminum-gallium interchange in aluminum-gallium arsenide - gallium-arsenide quantum well heterostructures (opens in a new tab)

  2. Donor-Induced Layer Disordering via Silicon Diffusion in Aluminum-Gallium Arsenide - Gallium-Arsenide Quantum-Well Heterostructures, and Disorder-Defined Index-Guided Stripe Geometry Laserdiodes

    … the proper diffusion conditions Si produces n-type conductivity in Al(,x)Ga(,1-x)As layers, and will counterdope (to n-type) initially p-type Al(,x)Ga(,1-x)As regions which form the top confining layer of p-n QW laser that is grown on an n-type GaAs substrate. Si diffusion is masked with a …

    uiuc Repository record for Donor-Induced Layer Disordering via Silicon Diffusion in Aluminum-Gallium Arsenide - Gallium-Arsenide Quantum-Well Heterostructures, and Disorder-Defined Index-Guided Stripe Geometry Laserdiodes (opens in a new tab)

  3. Highly Conductive Ultrananocrystalline Diamond Thin Films via Nitrogen Incorporation

    … biggest limiting factors has been the lack of n-type diamond films with suitable conductivity. This work demonstrates a method to fabricate a highly conductive, n-type diamond film via nitrogen doping. Ultrananocrystalline diamond (UNCD) films with up to 0.2% total nitrogen content were …

    uiuc Repository record for Highly Conductive Ultrananocrystalline Diamond Thin Films via Nitrogen Incorporation (opens in a new tab)

  4. Fabrication of Zinc Nitride Thin Films using RF Magnetron Sputtering Deposition for Optoelectronic Applications

    … direct transition. The zinc nitride showed n-type conductivity with low resistivity and high carrier concentration. To study the RF discharge power effect, the zinc nitride thin films were synthesized at different discharge powers densities. With discharge power density increasing, the film …

    ohiolink Repository record for Fabrication of Zinc Nitride Thin Films using RF Magnetron Sputtering Deposition for Optoelectronic Applications (opens in a new tab)

  5. Growth and Characterization of (InxGa1-x)2O3, and NiO Heterostructures

    … with each other with the alloy exhibited n-type conductivity with the resistivity, carrier concentration, and mobility value of ~ 0.6-50 Ω-cm, ~1017 - 1018 cm-3, and ~ 0.34 cm2V-1s-1, respectively. During the growth of Ga2O3 the use of, lanthanum aluminate (LAO) substrate and Sn dopant were …

    texas-state Repository record for Growth and Characterization of (InxGa1-x)2O3, and NiO Heterostructures (opens in a new tab)

  6. Process Dependence of Defects and Dopants in Wide Band Gap Semiconductor and Oxides

    … However, as-grown un-doped ZnO is naturally n-type and controllable p-type doping is still not stable and reliable. The origin of the n-type conductivity is also controversial, so the ability to understand and control the intrinsic and impurity related defects in ZnO is essential. We used …

    ohiolink Repository record for Process Dependence of Defects and Dopants in Wide Band Gap Semiconductor and Oxides (opens in a new tab)

  7. MOVPE growth and characterization of Al(Ga)N and InAlN/AlGaN quantum wells for UV LED applications

    … a working set of conditions, the screw and edge type dislocation density in the AlN were reduced to around 2.2×108 cm-2 and 1.3×109 cm-2 , respectively, using an optimized three-step process, as estimated by TEM. An atomically smooth surface with an RMS roughness of around 0.3 nm achieved over …

    cork Repository record for MOVPE growth and characterization of Al(Ga)N and InAlN/AlGaN quantum wells for UV LED applications (opens in a new tab)

  8. Investigation of doped ZnO by Molecular Beam Epitaxy for n- and p-type Conductivity

    … the currently dominant ITO in industries as n-type transparent electrodes and the difficulty in achieving reliable and reproducible p-type ZnO. On the one hand, n-type ZnO heavily doped with Al or Ga (AZO or GZO) is the most promising to replace ITO due to the low cost, abundant material …

    vcu Repository record for Investigation of doped ZnO by Molecular Beam Epitaxy for n- and p-type Conductivity (opens in a new tab)