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Showing 1 to 1 of 1 for “"modulated temperature annealing"”.

  1. ENGINEERING STRUCTURE AND PHASE VIA TEMPERATURE MANIPULATION IN THIN FILM OXIDES GROWN BY ALD

    Piercy, Brandon DeaneGeorgia Institute of Technology2019

    … and the ability to deposit at extremely low temperatures. One critical parameter in ALD growth is deposition temperature, which defines the “ALD window”—a temperature range in which ALD growth kinetics hold. Most ALD processes tend to be limited to deposition temperatures of <300 ˚C, causing …

    gatech Repository record