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Showing 1 to 3 of 3 for “"metallorganic chemical vapor deposition"”.
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Metallorganic chemical vapor deposition of lead oxide and lead titanate
… of this study was two-fold: firstly, the MOCVD deposition behavior of Pb(thd)2 was studied in detail and a one-dimensional kinetic model was proposed to successfully predict the effect of processing conditions on the deposition rate profile for PbO. Assuming the surface reaction is the …
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A Study of Amorphous Hydrogenated Titanium-Carbide Films: Structure, Stability, and Role of Hydrogen Doping
… and low-pressure (<10('-5) torr) metallorganic chemical vapor deposition (MOCVD) of the organometallic compound tetraneopentyl-titanium. X-ray and electron diffraction studies confirmed the amorphicity of the coatings, while controlled-heating experiments emphasized their stability …
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A study of amorphous hydrogenated titanium carbide films: Structure, stability, and role of hydrogen doping
… (150-300°C) and low-pressure (<10-S torr) metallorganic chemical vapor deposition (MOCVD) of the organometallic compound tetraneopentyl-titanium. X-ray and electron diffraction studies confirmed the amorphicity of the coatings, while controlled-heating experiments emphasized their stability …