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Showing 1 to 8 of 8 for “"metal-assisted chemical etching (MacEtch)"”.
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Metal-assisted chemical etching of 4H silicon carbide
Metal-assisted chemical etching (MacEtch) is a wet etching method that can produce high aspect ratio nanostructures with minimal crystal damage. The MacEtch process has been demonstrated to overcome limitations of dry and wet etching in several materials, studied extensively since its discovery by …
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Inverse metal-assisted chemical etching of indium phosphide with sub-20 nm scalability
Metal-assisted chemical etching (MacEtch), a wet etching method developed in 2000, has been the focus of extensive research in the area of semiconductor nanotechnology for the last decade, mainly in Si. In principle, MacEtch can be applicable to the other semiconductors if there exists a …
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Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication
… modules in semiconductor processing including etching have been extensively explored and implemented for a wide variety of device structures. One of the most novel techniques for etching semiconductors is metal-assisted chemical etching (MacEtch), a plasma-free wet etching method that utilizes …
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Metal-assisted chemical etching of β-gallium oxide
… surface due to high-energy ions, while most wet etching techniques can only produce very limited aspect ratios. In this thesis, β-Ga2O3 fin arrays by inverse metal-assisted chemical etching (MacEtch), under UV light irradiation, with a high aspect ratio and excellent surface quality, are …
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Nonlithographic manufacturing of 1-D silicon nanostructures with tunable surface morphology via thermal dewetting and metal-assisted chemical etching
… Au mesh on Si substrates. Followed by metal-assisted chemical etching (MacEtch), where the Au mesh serves as catalyst, arrays of smooth Si nanowires with tunable taper are produced. By using the Le Chatelier Principle, the rate of reduction relative to that of oxidation is increased by …
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Metal-assisted chemical etching of semiconductor nanostructures for electronic applications
Metal-assisted Chemical Etching (MacEtch) is a robust and versatile top-down etching process which has the capability of overcoming the limits of conventional wet and dry etching. The advantage of producing anisotropic high aspect ratio micro- and nanostructures with the absence of ion induced …
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Metal-assisted chemical etching as a disruptive platform for multi-dimensional semiconductor sculpting
The student, Karthik Balasundaram, submitted this Dissertation for approval on 2015-06-18 at 16:07.
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Metal-assisted chemical etching of III-V semiconductor materials for optoelectronic applications
Made available in DSpace on 2016-03-02T19:33:17Z (GMT). No. of bitstreams: 2 ZHAO-THESIS-2015.pdf: 2077971 bytes, checksum: 160453c3994747e9326d0908a0f90983 (MD5) LICENSE.txt: 4207 bytes, checksum: badcc874098be4440f0e37e192b9525d (MD5) Previous issue date: 2015-10-07