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Showing 1 to 1 of 1 for “"mass limited target"”.
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Radiation Studies Of The Tin-doped Microscopic Droplet Laser Plasma Light Source Specific To Euv Lithography
… technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes <35 nm. One major challenge to its implementation is the development of a 13.5 nm EUV source of radiation that meets the requirements of current roadmap designs of the source of illumination in …