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Showing 1 to 12 of 12 for “"mask design"”.

  1. Microfluidic cancer cell isolation system using magnetic nanoparticle hybrids and advanced interdigitated electrode technology

    … full year was been spent on literature review, designing the microfluidic system, training fabrication and characterization techniques, fabricating component 1 through photolithography, and characterizing surface smoothness and height variation, through atomic force microscopy, and confirming …

    whiterose Repository record for Microfluidic cancer cell isolation system using magnetic nanoparticle hybrids and advanced interdigitated electrode technology (opens in a new tab)

  2. Double-Exposure Gray-Scale Photolithography

    … through sub-resolution pixels on a photomask. The number of photoresist levels is determined by the number of different pixel sizes on the mask, which is restricted by mask fabrication. This drawback prevents the use of gray-scale photolithography for applications that need a high …

    maryland Repository record for Double-Exposure Gray-Scale Photolithography (opens in a new tab)

  3. Linear and non linear coupling effects in sequence of microresonators

    … through analytic and FEM simulations, GDS mask design, experimental characterizations. All the devices parameters are carefully reported to allow the reproduction of the experimental results. Where it was possible, suggestions on how to improve the fabricated devices performance were given.

    trento Repository record for Linear and non linear coupling effects in sequence of microresonators (opens in a new tab)

  4. Characterization of the photochemical etching process: an alternative microfluidic device fabrication method

    … costs by: (1) replacing expensive lithography mask design software with easily accessible Microsoft PowerPoint, (2) eliminating reliance on multiple lithography masks through virtual mask incorporation, and (3) eliminating the need for cleanroom use by relying on a projector- based optical …

    uiuc Repository record for Characterization of the photochemical etching process: an alternative microfluidic device fabrication method (opens in a new tab)

  5. X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication

    … with precision alignment of upper to lower-gate masks. In order to obtain optimum device performance, the position of the lower-gate should be aligned to the upper-gate to better than 10% of the gate length. The gates are defined using X-ray lithography (a close-proximity shadow printing scheme). …

    mit Repository record for X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication (opens in a new tab)

  6. Fabrication and applications of zinc indiffused waveguides in periodically poled lithium niobate

    … electrode materials, patterning quality, and mask design, are investigated and analysed systematically. In addition, back-switch poling methods (involving poling a sample completely and then re-poling) are demonstrated. By using optimized processes combining high electric-field poling with the …

    soton Repository record for Fabrication and applications of zinc indiffused waveguides in periodically poled lithium niobate (opens in a new tab)

  7. Photonic integrated circuits for optical logic applications

    … in this thesis, including optimization of the mask design, photolithography, etching, and backside processing techniques. Testing and characterization of the active and passive components is also reported, confirming gain and emission at 1550 nm for the SOAs, as well as verifying evanescent …

    mit Repository record for Photonic integrated circuits for optical logic applications (opens in a new tab)

  8. Characterization and modeling of pattern dependencies in copper interconnects for integrated circuits

    … the methodology consists of test structure and mask design to examine feature scale copper step height and the height of copper array regions as a function of underlying layout parameters. Semi-empirical response surface models are then generated with model parameters extracted from conventional …

    mit Repository record for Characterization and modeling of pattern dependencies in copper interconnects for integrated circuits (opens in a new tab)

  9. Evaluating the Head Injury Risk Associated with Baseball and Softball

    … Reduced injury factor balls, infield softball masks, batter's helmets, and catcher's masks have all been integrated into baseball and softball as a means for preventing serious head injury from ball impact. The research in this thesis had four objectives: to compare the responses of the Hybrid …

    vt Repository record for Evaluating the Head Injury Risk Associated with Baseball and Softball (opens in a new tab)

  10. Design, Fabrication and Characterization of a GaAs/InxGa1-xAs/GaAs Heterojunction Bipolar Transistor

    Designs for PnP GaAs/InxGa1-xAs/GaAs heterojunction bipolar transistors (HBTs) are proposed and simulated with the aid of commercial software. Band diagrams, Gummel plots and common emitter characteristics are shown for the specific case of x=1, x=0.7, and x linearly graded from 0.75 to 0.7. Of the …

    vt Repository record for Design, Fabrication and Characterization of a GaAs/InxGa1-xAs/GaAs Heterojunction Bipolar Transistor (opens in a new tab)

  11. Conformable Ultrasound Face Patch for Cavitation-enhanced Transdermal Cosmeceutical Delivery

    … and dermis layers of the skin. A novel face mask design with piezoelectric transducers embedded in a soft elastomer substrate is fabricated and investigated, starting from a single-element prototype and subsequently a full two-dimensional array. Localized pockets of fluid coupling medium are …

    mit Repository record for Conformable Ultrasound Face Patch for Cavitation-enhanced Transdermal Cosmeceutical Delivery (opens in a new tab)

  12. Dressed to kill: the costume design for Merry debaucheries and a Dance with death

    lethbridge