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Showing 1 to 3 of 3 for “"ion-to-neutral ratio"”.

  1. Development of PVD coating processes informed by plasma diagnostics.

    Physical vapour deposition technologies have been on the fast track of development for the last two decades due to their ability to meet demands for special materials and performance tools. The ever increasing complexity of the required coating microstructure and chemical composition can be …

    sheffield-hallam Repository record for Development of PVD coating processes informed by plasma diagnostics. (opens in a new tab)

  2. Determination of Ionization Fraction and Plasma Potential in a DC Magnetron Sputtering System Using a Quartz Crystal Microbalance and a Gridded Energy Analyzer

    Made available in DSpace on 2017-07-06T18:48:17Z (GMT). No. of bitstreams: 3 Green_Karyn_M_MS.pdf: 35887684 bytes, checksum: 4d8ec8bef5ab4e9e6aabee4e3ff410a5 (MD5) Green_Karyn_M_MS_ABS.pdf: 507343 bytes, checksum: 0d504c63e61c048bbb16c0ee4bce83fa (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record for Determination of Ionization Fraction and Plasma Potential in a DC Magnetron Sputtering System Using a Quartz Crystal Microbalance and a Gridded Energy Analyzer (opens in a new tab)

  3. High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis.

    Physical vapour deposition (PVD) technology is widely used for deposition of coatings with applications in various industries; coatings in semiconductor industry, optical coatings or hard coatings mostly used in car and aerospace industries. In 1999 novel physical vapour deposition technology …

    sheffield-hallam Repository record for High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis. (opens in a new tab)