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Showing 1 to 2 of 2 for “"high-k Oxide"”.

  1. Characterization and modeling of low-frequency noise in Hf-based high -kappa dielectrics for future cmos applications

    … Roadmap for Semiconductors outlines the need for high-K dielectric based gate-oxide Metal Oxide Semiconductor Field Effect Transistors for sub-45 nm technology nodes. Gate oxides of hafnium seem to be the nearest and best alternative for silicon dioxide, when material, thermal and structural …

    njit Repository record for Characterization and modeling of low-frequency noise in Hf-based high -kappa dielectrics for future cmos applications (opens in a new tab)

  2. Hochauflösende Rutherford-Streuspektrometrie zur Untersuchung von ZrO2-Schichtwachstum im Anfangsstadium

    Die vorliegende Arbeit entstand im Rahmen einer Kooperation des Forschungszentrums Dresden-Rossendorf mit Qimonda Dresden GmbH & Co. OHG. Mithilfe der hochauflösenden Rutherford-Streuspektrometrie (HR-RBS) wurden das Diffusionsverhalten und Schichtwachstum von ZrO2 auf SiO2 und TiN im …

    qucosa-diss