Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 5 of 5 for “"fluorocarbon polymer"”.
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Surface Reaction Mechanisms for Plasma Processing of Semiconductors
Cleaning of residual polymer from trenches following etching and the deposition of a continuous barrier layer are critical processes for integration PS as ILDs. To investigate these issues, a reaction mechanism for plasma stripping of residual fluorocarbon polymer using oxygen-based chemistries has …
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Chemical studies of plasma etchants used in integrated circuit manufacture
… and the complementary technique of plasma polymerisation are presented in this thesis. Optical emission spectroscopy with argon actinometry was used as the principle plasma diagnostic. Statistical experimental design was used to model and compare Si and Si02 etch rates in CF4 and SF6 …
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THE EFFECT OF STRAIN ON THE ELECTRICAL RESISTIVITY OF THIN FILMS
… cermet films is established. The gauge factor of fluorocarbon-polymer gold films and the gauge factor and T.C.R. of aluminium/aluminium oxide films have been measured. The measured gauge factors are discussed in terms of a meandering three-dimensional conduction path.
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Generation and Characterization of Energetic Neutral Beams for Surface Modification
… can be generated and characterized for modifying polymer substrates in a charge-less etching environment, without profile distortion.<br></br><br></br>A modified inductively coupled plasma source was constructed to characterize processing plasmas and generate a source of energetic neutral …
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Volumetric heat capacity enhancement in ultrathin fluorocarbon polymers for capacitive thermal management
… storage density arising from size e ects in thin polymer lms. We design and fabricate a micro-calorimeter to measure the volumetric heat capacity of nanometer scale thin uorocarbon polymer lms. The storage density increases approximately three times as the lm thickness decreases from 27 nm to 12 …