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Showing 1 to 20 of 26 for “"film stress"”.

  1. Nanoporous Gold: Mechanics of Fabrication and Actuation

    … Nanoporous Gold (NPG), the complex nature of the film stress evolution in thin films during their fabrication and during surface charging. Fabrication of microstructures comprised of NPG requires a precise control over selective corrosion of the precursor alloy. In many designs, the precursor …

    columbia-diss Repository record for Nanoporous Gold: Mechanics of Fabrication and Actuation (opens in a new tab)

  2. Microelectromechanical (MEMS) structures for thin film property measurement

    … structures to determine thin film mechanical properties, including intrinsic stresses of deposited metal films. An overview of the importance of thin film stress measurement and the advantages of this particular MEMS-­based technique provides motivation for this study. A new …

    mit Repository record for Microelectromechanical (MEMS) structures for thin film property measurement (opens in a new tab)

  3. Stress and structure evolution during Volmer-Weber growth of thin films

    To investigate stress evolution during film deposition, a novel electrical technique for in situ thin film stress measurements was developed utilizing piezoresistive silicon microcantilevers, or piezocantilevers. In addition to the thin film stress measurements of Cu made with the piezocantilevers, …

    mit Repository record for Stress and structure evolution during Volmer-Weber growth of thin films (opens in a new tab)

  4. An in Situ Study of the Stresses in Silicide Thin Films

    … technique has been introduced to determine the film stress of metal silicon interfaced materials in-situ. This technique requires the use of a spatially wide yet highly collimated white beam of synchrotron radiation, and a properly chosen filter. The technique is properly termed Absorption Edge …

    uiuc Repository record for An in Situ Study of the Stresses in Silicide Thin Films (opens in a new tab)

  5. Influence of design and coatings on the mechanical reliability of semiconductor wafers.

    … and the effect on strength. Thin, solid, pre-stressed films are proposed as a means to improve the bulk mechanical properties of a wafer. Three-point bending was used to evaluate the laser scribe density and chemical processing effect on wafer strength. Drop and strike tests were employed to …

    unt Repository record for Influence of design and coatings on the mechanical reliability of semiconductor wafers. (opens in a new tab)

  6. Phase stability in ti/bcc multilayered thin films

    … systematic study using Ti/bcc multilayered thin film architectures. The influences of lattice misfit, layer thickness, composition and chemical intermixing on the phase stability are determined. In situ thin film growth stresses of these materials are measured and correlated to the interfacial …

    alabama Repository record for Phase stability in ti/bcc multilayered thin films (opens in a new tab)

  7. ADVANCED MATERIALS DEVELOPMENT AND MANUFACTURING - DEVELOPMENT OF THERMALLY STABLE THIN FILMS WITH HIGH STRESS TUNABILITY

    … or NAND cells vertically. The higher number of film deposition from NAND cell stacking result in higher compressive wafer bow of Production Silicon Wafers which is undesirable in manufacturing process flow due to downstream process and/or yield downside. With increasing vertical scaling up of 3D …

    nus Repository record for ADVANCED MATERIALS DEVELOPMENT AND MANUFACTURING - DEVELOPMENT OF THERMALLY STABLE THIN FILMS WITH HIGH STRESS TUNABILITY (opens in a new tab)

  8. Fabrication of extremely smooth blazed diffraction gratings

    … such as gold. Deposition of thin metal film often develops residual stress that adds out-of-plane distortion. In this thesis the out-of-plane distortions due to thin metal films are analyzed using wavefront aberration functions known as the Zernike polynomials. The thin film stress is …

    mit Repository record for Fabrication of extremely smooth blazed diffraction gratings (opens in a new tab)

  9. ALUMINUM SCANDIUM NITRIDE (AlScN) FILMS FOR MICROELECTROMECHANICAL SYSTEMS (MEMS)

    … of Alu- minum Scandium Nitride (AlScN) films and resonator devices for applications in Micro- electromechanical systems (MEMs) especially in Fifth Generation (5G) cellular technology. Various internal stress arise during the process for developing AlScN films. Abnormal Ori- ented Grains …

    penn Repository record for ALUMINUM SCANDIUM NITRIDE (AlScN) FILMS FOR MICROELECTROMECHANICAL SYSTEMS (MEMS) (opens in a new tab)

  10. High-Precision Stress Measurement in Thin Films for X-Ray Mirrors

    … makes them susceptible to deformations caused by stress in their reflective coatings. Much research has been dedicated to figuring coated mirrors that have been deformed by their coatings and in creating low stress coatings. These coatings need to be stable over decades for the length of the …

    mit Repository record for High-Precision Stress Measurement in Thin Films for X-Ray Mirrors (opens in a new tab)

  11. Design, fabrication, and characterization of an ultra-low cost inductively-coupled plasma chemical vapor deposition tool for micro- and nanofabrication

    … ( : 150*C) to deposit uniform silicon-based films with a high quality comparable to films deposited in research-grade commercial tools. Using response surface methods, the performance of the ICP-CVD system has been characterized for both silicon dioxide and silicon nitride films, and …

    mit Repository record for Design, fabrication, and characterization of an ultra-low cost inductively-coupled plasma chemical vapor deposition tool for micro- and nanofabrication (opens in a new tab)

  12. Design, Fabrication, and Characterization of a Thin-Film Nickel-Titanium Shape Memory Alloy Diaphragm for Use in Micro-Electro-Mechanical Systems

    … work done at Cal Poly has shown that thin-film nickel-titanium (NiTi) can be easily sputtered onto silicon wafers and annealed to create a crystallized shape memory alloy (SMA) film. Initial work on creating devices yielded cantilevers that were highly warped due to thin-film stress created …

    calpoly Repository record for Design, Fabrication, and Characterization of a Thin-Film Nickel-Titanium Shape Memory Alloy Diaphragm for Use in Micro-Electro-Mechanical Systems (opens in a new tab)

  13. Crack Patterns in Thin Films and X-ray Optics Thermal Deformations

    Thin films and multilayers are widely used in many applications, ranging from X-ray optics to microelectronic devices. In service, the X-ray optics elements are exposed to the X-ray beam, which heats up the structure resulting in the thermal deformations, and consequently in distortions of the …

    usf Repository record for Crack Patterns in Thin Films and X-ray Optics Thermal Deformations (opens in a new tab)

  14. High moment shield structures for improved linear density capability in thin film recording heads

    … Co70Fe30 and establish a uniaxial anisotropy. Film stress is also significantly reduced. TEM and Fresnel-mode Lorentz TEM imaging of Ni79Fe21 seeded Ni45Fe55 reveal significant reductions in grain size and magnetic ripple dispersion, no significant texture is measured. It is proposed that …

    qu-belfast Repository record for High moment shield structures for improved linear density capability in thin film recording heads (opens in a new tab)

  15. Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys

    … thesis will focus on the fabrication of thin film NiTi by DC magnetron sputtering deposition and testing mechanical properties of the fabricated films by nanoindentation. Thin film NiTi SMA was successfully created by DC magnetron sputtering deposition and high vacuum annealing in the …

    calpoly Repository record for Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys (opens in a new tab)

  16. Opto-fluidic neural probes for optogenetic brain interrogation

    … blocks of high yield fluidic packaging, a film stress tuning mechanism for straight microneedle fabrication, and an integration and co-packaging scheme with photonics are established to support the development of a state-of-the-art fluidics neural probe platform.

    uiuc Repository record for Opto-fluidic neural probes for optogenetic brain interrogation (opens in a new tab)

  17. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability

    … silicon (a-Si:H). Silicon nitride (SiNₓ) thin films are currently the dielectric widely applied in the microelectronics industry and are also effective antireflective and passivating layers for multicrystalline silicon solar cells. Research into the synthesis and characterization of nc-Si:H and …

    western-cape Repository record for Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability (opens in a new tab)

  18. Piezoelectric effects in GaAs MESFET's

    … at several steps in their fabrication. A common film used for device passivation is silicon nitride. This passivation film is deposited on gallium arsenide substrates by chemical vapor deposition techniques and possesses high intrinsic stress. The stresses arise from the difference in the gallium …

    vt Repository record for Piezoelectric effects in GaAs MESFET's (opens in a new tab)

  19. Processing - structure - property interrelationships of ferroelectric thin films with emphasis on formation kinetics

    … many interesting properties. Recently, PZT thin films have been considered as one of the most promising materials for the application of nonvolatile electronic memories. In this study, a sol-gel process for PZT film preparation was adopted and greatly modified. PZT films with very desirable …

    vt Repository record for Processing - structure - property interrelationships of ferroelectric thin films with emphasis on formation kinetics (opens in a new tab)

  20. Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films

    … nitride (B-C-N-H) and titanium nitride (Ti-N-Cl) films synthesized by low pressure chemical vapor deposition (LPCVD) using ammonia (NH_3)/triethylamine-borane and NH_3/titanium tetrachloride as reactants, respectively.Several analytical methods such as the FTIR, UVNisible spectroscopy, XPS, AES, …

    njit Repository record for Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films (opens in a new tab)

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