Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 26 for “"film stress"”.
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Nanoporous Gold: Mechanics of Fabrication and Actuation
… Nanoporous Gold (NPG), the complex nature of the film stress evolution in thin films during their fabrication and during surface charging. Fabrication of microstructures comprised of NPG requires a precise control over selective corrosion of the precursor alloy. In many designs, the precursor …
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Microelectromechanical (MEMS) structures for thin film property measurement
… structures to determine thin film mechanical properties, including intrinsic stresses of deposited metal films. An overview of the importance of thin film stress measurement and the advantages of this particular MEMS-based technique provides motivation for this study. A new …
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Stress and structure evolution during Volmer-Weber growth of thin films
To investigate stress evolution during film deposition, a novel electrical technique for in situ thin film stress measurements was developed utilizing piezoresistive silicon microcantilevers, or piezocantilevers. In addition to the thin film stress measurements of Cu made with the piezocantilevers, …
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An in Situ Study of the Stresses in Silicide Thin Films
… technique has been introduced to determine the film stress of metal silicon interfaced materials in-situ. This technique requires the use of a spatially wide yet highly collimated white beam of synchrotron radiation, and a properly chosen filter. The technique is properly termed Absorption Edge …
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Influence of design and coatings on the mechanical reliability of semiconductor wafers.
… and the effect on strength. Thin, solid, pre-stressed films are proposed as a means to improve the bulk mechanical properties of a wafer. Three-point bending was used to evaluate the laser scribe density and chemical processing effect on wafer strength. Drop and strike tests were employed to …
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Phase stability in ti/bcc multilayered thin films
… systematic study using Ti/bcc multilayered thin film architectures. The influences of lattice misfit, layer thickness, composition and chemical intermixing on the phase stability are determined. In situ thin film growth stresses of these materials are measured and correlated to the interfacial …
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ADVANCED MATERIALS DEVELOPMENT AND MANUFACTURING - DEVELOPMENT OF THERMALLY STABLE THIN FILMS WITH HIGH STRESS TUNABILITY
… or NAND cells vertically. The higher number of film deposition from NAND cell stacking result in higher compressive wafer bow of Production Silicon Wafers which is undesirable in manufacturing process flow due to downstream process and/or yield downside. With increasing vertical scaling up of 3D …
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Fabrication of extremely smooth blazed diffraction gratings
… such as gold. Deposition of thin metal film often develops residual stress that adds out-of-plane distortion. In this thesis the out-of-plane distortions due to thin metal films are analyzed using wavefront aberration functions known as the Zernike polynomials. The thin film stress is …
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ALUMINUM SCANDIUM NITRIDE (AlScN) FILMS FOR MICROELECTROMECHANICAL SYSTEMS (MEMS)
… of Alu- minum Scandium Nitride (AlScN) films and resonator devices for applications in Micro- electromechanical systems (MEMs) especially in Fifth Generation (5G) cellular technology. Various internal stress arise during the process for developing AlScN films. Abnormal Ori- ented Grains …
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High-Precision Stress Measurement in Thin Films for X-Ray Mirrors
… makes them susceptible to deformations caused by stress in their reflective coatings. Much research has been dedicated to figuring coated mirrors that have been deformed by their coatings and in creating low stress coatings. These coatings need to be stable over decades for the length of the …
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Design, fabrication, and characterization of an ultra-low cost inductively-coupled plasma chemical vapor deposition tool for micro- and nanofabrication
… ( : 150*C) to deposit uniform silicon-based films with a high quality comparable to films deposited in research-grade commercial tools. Using response surface methods, the performance of the ICP-CVD system has been characterized for both silicon dioxide and silicon nitride films, and …
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Design, Fabrication, and Characterization of a Thin-Film Nickel-Titanium Shape Memory Alloy Diaphragm for Use in Micro-Electro-Mechanical Systems
… work done at Cal Poly has shown that thin-film nickel-titanium (NiTi) can be easily sputtered onto silicon wafers and annealed to create a crystallized shape memory alloy (SMA) film. Initial work on creating devices yielded cantilevers that were highly warped due to thin-film stress created …
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Crack Patterns in Thin Films and X-ray Optics Thermal Deformations
Thin films and multilayers are widely used in many applications, ranging from X-ray optics to microelectronic devices. In service, the X-ray optics elements are exposed to the X-ray beam, which heats up the structure resulting in the thermal deformations, and consequently in distortions of the …
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High moment shield structures for improved linear density capability in thin film recording heads
… Co70Fe30 and establish a uniaxial anisotropy. Film stress is also significantly reduced. TEM and Fresnel-mode Lorentz TEM imaging of Ni79Fe21 seeded Ni45Fe55 reveal significant reductions in grain size and magnetic ripple dispersion, no significant texture is measured. It is proposed that …
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Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys
… thesis will focus on the fabrication of thin film NiTi by DC magnetron sputtering deposition and testing mechanical properties of the fabricated films by nanoindentation. Thin film NiTi SMA was successfully created by DC magnetron sputtering deposition and high vacuum annealing in the …
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Opto-fluidic neural probes for optogenetic brain interrogation
… blocks of high yield fluidic packaging, a film stress tuning mechanism for straight microneedle fabrication, and an integration and co-packaging scheme with photonics are established to support the development of a state-of-the-art fluidics neural probe platform.
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Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
… silicon (a-Si:H). Silicon nitride (SiNₓ) thin films are currently the dielectric widely applied in the microelectronics industry and are also effective antireflective and passivating layers for multicrystalline silicon solar cells. Research into the synthesis and characterization of nc-Si:H and …
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Piezoelectric effects in GaAs MESFET's
… at several steps in their fabrication. A common film used for device passivation is silicon nitride. This passivation film is deposited on gallium arsenide substrates by chemical vapor deposition techniques and possesses high intrinsic stress. The stresses arise from the difference in the gallium …
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Processing - structure - property interrelationships of ferroelectric thin films with emphasis on formation kinetics
… many interesting properties. Recently, PZT thin films have been considered as one of the most promising materials for the application of nonvolatile electronic memories. In this study, a sol-gel process for PZT film preparation was adopted and greatly modified. PZT films with very desirable …
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Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films
… nitride (B-C-N-H) and titanium nitride (Ti-N-Cl) films synthesized by low pressure chemical vapor deposition (LPCVD) using ammonia (NH_3)/triethylamine-borane and NH_3/titanium tetrachloride as reactants, respectively.Several analytical methods such as the FTIR, UVNisible spectroscopy, XPS, AES, …
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