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Showing 1 to 1 of 1 for “"extreme ultraviolet interference lithography"”.
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Templated self-assembly of SiGe quantum dots
… templated self-assembly, which combines top-down lithography with bottom-up self-assembly. In this process the lithographically defined pits serve as pre-defined nucleation points for the epitaxially grown quantum dots. In this thesis, extreme ultra-violet interference lithography at a wavelength …