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Showing 1 to 1 of 1 for “"extrem ultraviolette Interferenzlithographie"”.
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Templated self-assembly of SiGe quantum dots
… epitaxially grown quantum dots. In this thesis, extreme ultra-violet interference lithography at a wavelength of 13.4 nm is employed for pre-patterning of the Si substrates. This technique allows the precise and fast fabrication of high-resolution templates with a high degree of reproducibility. …