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Showing 1 to 2 of 2 for “"energetic neutrals"”.
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Diagnosis of the flux emanating from the intermediate focus of an extreme ultraviolet light lithography source
… EUV light lithography tools, the transport of energetic species that can damage post-intermediate focus optics and increase the cost of tool ownership. In this paper, the effects of chamber pressure, buffer gas mass, and pinch gas mass on debris transport will be explored using the XTREME XTS …
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Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources
… hurdles. One such hurdle is the existence of energetic debris emitted by the dense warm plasmas (~1019cm-3, ~30 eV) used to create the EUV light. EUV’s high absorbance into most known materials prevents the traditional use of a pellicle to protect the collection optics, which reflect the …