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Showing 1 to 2 of 2 for “"e-beam lithographie"”.

  1. Development of nanofocusing refractive X-ray lenses

    According to the results of this work the following conclusions can be made:•The microfabrication process of silicon nanofocusing lenses is optimised. With these lenses a lateral resolution of 50 nm was achieved and this resolution approaches the theoretical limit. Using the same process for the …

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  2. Quantentransport in III-V-Halbleiternanosäulen

    … with the help of a high resolution electron beam resist Hydrogen-Silsesquioxan (HSQ). For the top metal semiconductor contact, a novel nonalloyed shallow ohmic contact based on low temperature grown (LTG) GaAs has been developed. HSQ is used also for sample planarization and physical …

    aachen Repository record for Quantentransport in III-V-Halbleiternanosäulen (opens in a new tab)