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Showing 1 to 20 of 95 for “"e-beam"”.

  1. Polynomial time optimal algorithm for stencil row planning in e-beam lithography

    Electron beam lithography (EBL) is a very promising candidate for integrated circuit (IC) fabrication beyond the 10 nm technology node. To address its throughput issue, the Character Projection (CP) technique has been proposed, and its stencil planning can be optimized with awareness of overlapping …

    uiuc Repository record for Polynomial time optimal algorithm for stencil row planning in e-beam lithography (opens in a new tab)

  2. Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)

    Spatial-phase-locked electron-beam lithography (SPLEBL) is a new paradigm for scanning electron-beam lithography (SEBL) that permits nanometer-level pattern placement accuracy. Unlike conventional SEBL systems which run in an open-loop fashion, SPLEBL uses continuous feedback to directly monitor …

    mit Repository record for Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL) (opens in a new tab)

  3. Design of a high-voltage controller for e-beam and optical MSLM

    Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1985.

    mit Repository record for Design of a high-voltage controller for e-beam and optical MSLM (opens in a new tab)

  4. Comparison of Chlorophyll, Carotenoid, and Alpha-tocopherol in E-beam, Gamma, and X-ray Treated 'Granny Smith' Apples

    … with gamma (0.2 kGy), X-ray (0.495 kGy), and e-beam (0.77 kGy) radiation and stored in air at 1 ⁰C for up to four months. Non-irradiated apples were used as control fruit. Peels of irradiated and non-irradiated apples were collected and quantified for chlorophyll, carotenoids, alpha-tocopherol, …

    chapman Repository record for Comparison of Chlorophyll, Carotenoid, and Alpha-tocopherol in E-beam, Gamma, and X-ray Treated 'Granny Smith' Apples (opens in a new tab)

  5. The Effects of E-Beam Irradiation, Microwave Energy and High Hydrostatic Pressure on Presence and Health Significance of Cryptosporidium parvum in Eastern Oysters (Crassostrea virginica)

    … three alternative food-processing treatments (e-beam irradiation, microwave energy, and high hydrostatic pressure processing) on the viability of C. parvum oocysts in Eastern oysters. Oysters were artificially infected with the Beltsville strain of C. parvum and subjected to the three treatments …

    vt Repository record for The Effects of E-Beam Irradiation, Microwave Energy and High Hydrostatic Pressure on Presence and Health Significance of Cryptosporidium parvum in Eastern Oysters (Crassostrea virginica) (opens in a new tab)

  6. Biomechanische Untersuchungen an humanen allogenen Sehnentransplantaten nach Elektronenstrahl- und Gammabestrahlung

    … daher darin, dosisabhängige Einflüsse der E-Beam- und Gamma Sterilisation auf die Biomechanik von allogenen und autologen Sehnen zu überprüfen. Erstmals wurde dabei eine fraktionierte E-Beam-Sterilisation untersucht, bei der die erforderliche minimale Dosis von 34 kGy in 10 Bestrahlungszyklen …

    tu-berlin Repository record for Biomechanische Untersuchungen an humanen allogenen Sehnentransplantaten nach Elektronenstrahl- und Gammabestrahlung (opens in a new tab)

  7. Impact of Phytosanitary Irradiation on Polar Antioxidants in Peels of ‘Granny Smith’ Apples

    … study aimed to evaluate the effects of gamma, e-beam, and X-ray irradiation on phenolic compounds, vitamin C content, and total antioxidant capacity in ‘Granny Smith’ apple peels. The results indicated that there were no significant changes in vitamin C content immediately following irradiation. …

    chapman Repository record for Impact of Phytosanitary Irradiation on Polar Antioxidants in Peels of ‘Granny Smith’ Apples (opens in a new tab)

  8. Investigation of fabrication process development for integrated optical grating structures

    … techniques are investigated. Exposure by e-beam and laser are two direct write methods which are used. These methods preclude the need of a mask, require few processing steps, and can be used to write features of sizes desired for optical gratings. In this research, we explore and develop …

    wvu Repository record for Investigation of fabrication process development for integrated optical grating structures (opens in a new tab)

  9. Nanometer-scale placement in electron-beam lithography

    Electron-beam lithography is capable of high-resolution lithographic pattern generation (down to 10 nm or below). However, for conventional e-beam lithography, pattern-placement accuracy is inferior to resolution. Despite significant efforts to improve pattern placement, a limit is being …

    mit Repository record for Nanometer-scale placement in electron-beam lithography (opens in a new tab)

  10. Feasibility and Conceptual Design of a C.W. Positron Source at CEBAF

    … characteristics: high current incident electron beam at 126 MeV with a high beam power (up to a MW); CW e−beam and CW e+ production. The multiple scattering is a dominant process when creating e+ in a target, which results a large phase space area of the emitted positrons. An admittance study was …

    odu Repository record for Feasibility and Conceptual Design of a C.W. Positron Source at CEBAF (opens in a new tab)

  11. Initiated chemical vapor deposition of functional polyacrylic thin films

    … The retained epoxy groups can crosslink under e-beam irradiation, resulting in e-beam patterning of iCVD PGMA thin films with 80 nm negative-tone features achieved. iCVD copolymerization was also investigated to further tune film composition and properties. A surface propagation mechanism was …

    mit Repository record for Initiated chemical vapor deposition of functional polyacrylic thin films (opens in a new tab)

  12. Design and characterization of Si/SiGe heterostructure sub-100 nm bulk p-MOSFET

    … source/drain and fully silicided (FUSI) gate. E-beam lithography is used for patterning nano scale gate with hydrogen silsequioxane (HSQ) e-beam resist and proper cleaning process for CMOS process compatibility. Extraction of carrier transport parameters for deep submicron devices will be also …

    mit Repository record for Design and characterization of Si/SiGe heterostructure sub-100 nm bulk p-MOSFET (opens in a new tab)

  13. Functional 2D nanoparticle/polymer array : interfacial assembly, transfer, characterization, and coupling to photonic crystal cavities

    … as a photoresist enabling two modes of electron beam (e-beam) nanoparticle patterning. These ultra-thin films of monolayer nanoparticle arrays are of fundamental interest as 2D artificial solids for electronic, magnetic and optical properties and are also of technological interest for a diverse …

    unm Repository record for Functional 2D nanoparticle/polymer array : interfacial assembly, transfer, characterization, and coupling to photonic crystal cavities (opens in a new tab)

  14. Optical rectification in semiconductor waveguides

    … conventional photolithography techniques and e-beam lithography techniques. The advantages of e-beam lithography are: better pattern definition, perfect alignment and easier lift-off process. The only disadvantage is the cost associated with running the e-beam writer and maybe the time it takes …

    glasgow Repository record for Optical rectification in semiconductor waveguides (opens in a new tab)

  15. Fabrication and applications of in-fiber semiconductor and metal microspheres

    … approaches, such as through ball milling or e-beam lithography, or via bottom-up approaches, such as colloidal chemistry. Top-down approaches often generate a wide particle size distribution, while bottom up approaches often involve toxic and sometimes rather expensive precursors to generate …

    mit Repository record for Fabrication and applications of in-fiber semiconductor and metal microspheres (opens in a new tab)

  16. A micromachined thermo-optical light modulator based on semiconductor-to-metal phase transition

    … film was synthesized by thermal oxidation of e-beam evaporated vanadium metal film. The oxidized film exhibits a phase transition at ~65 C with a hysteresis of about 15 C. A transmittance switching from ~90% to ~30% in the near infrared and a reflectance switching from ~50% to 15% in the visible …

    njit Repository record for A micromachined thermo-optical light modulator based on semiconductor-to-metal phase transition (opens in a new tab)

  17. ΗΛΙΑΚΕΣ ΚΥΨΕΛΙΔΕΣ ΠΥΡΙΤΙΟΥ ΚΑΤΑΣΚΕΥΑΣΜΕΝΕΣ ΜΕ ΤΗ ΜΕΘΟΔΟ ΤΗΣ ΙΟΝΤΙΚΗΣ ΕΜΦΥΤΕΥΣΗΣ

    … WAS OBTAINED BY LASERS (PULSE OR CONTINUOUS), E-BEAM (PULSE OR CONTINUOUS). INCOHERENT LIGHT AND WITH SELF ANNEALING THE PROFILE CONCENTRATION AND THE MOBILITY OF CARRIES WAS MEASUREDAND DETERMINED BY ETCHING THE SURFACE OF THE SAMPLES THEN THE METHOD OF THE FOUR POINTS (VAN DER PAUW GEOMETRY AND …

    greece Repository record for ΗΛΙΑΚΕΣ ΚΥΨΕΛΙΔΕΣ ΠΥΡΙΤΙΟΥ ΚΑΤΑΣΚΕΥΑΣΜΕΝΕΣ ΜΕ ΤΗ ΜΕΘΟΔΟ ΤΗΣ ΙΟΝΤΙΚΗΣ ΕΜΦΥΤΕΥΣΗΣ (opens in a new tab)

  18. Field emission from carbon nanotubes deposited on platinum and nickel/nickel oxide multilayers

    … / nickel oxide. Nickel oxide was deposited by e-beam evaporation or grown by thermal oxidation and characterized by Auger electron spectroscopy, x-ray diffraction and ellipsometry. Carbon nanotubes were deposited onto these test structures and current-voltage measurements were taken. …

    mit Repository record for Field emission from carbon nanotubes deposited on platinum and nickel/nickel oxide multilayers (opens in a new tab)

  19. Spectroscopic characterisation of high dielectric constant materials on semiconducting surfaces

    … analysis of hafnium oxide grown by micro e-beam deposition in an oxygen atmosphere on an ultra-thin SiO2 buffer layer was carried out using XPS and synchrotron radiation. The self-limiting growth of an interfacial hafnium silicate layer was observed and the substrate temperature during the …

    dcu Repository record for Spectroscopic characterisation of high dielectric constant materials on semiconducting surfaces (opens in a new tab)

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