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Showing 1 to 2 of 2 for “"dual ion beam sputtering"”.

  1. Stress in ion-beam assisted silicon dioxide and tantalum pentoxide thin films

    … thin films, deposited at room temperature by ion-beam sputtering (IBS) and dual ion-beam sputtering (DIBS), and Si02 films, deposited by reactive e-beam evaporation and ion-assisted deposition, were studied. The energy (150-600 eV) and ion-to-atom arrival ratio (0.27-2.0) of assisting argon …

    salford Repository record for Stress in ion-beam assisted silicon dioxide and tantalum pentoxide thin films (opens in a new tab)