Global ETD Search

Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.

Results

Showing 1 to 1 of 1 for “"dopant penetration"”.

  1. Materials properties of hafnium and zirconium silicates: Metal interdiffusion and dopant penetration studies.

    … stability, electrical properties, and reduce dopant penetration. Because CMOS processing requires high temperature anneals (up to 1050 °C), it is important to understand the diffusion properties of any metal associated with the gate dielectric in silicon at these temperatures. In addition, …

    unt Repository record for Materials properties of hafnium and zirconium silicates: Metal interdiffusion and dopant penetration studies. (opens in a new tab)