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Showing 1 to 20 of 29 for “"dc-magnetron sputtering"”.
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Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical …
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Atomic mechanisms of stress formation of group IVB-VIB transition metal nitrides deposited by DC magnetron sputtering
… (CVD), Atomic layer deposition (ALD), RF-sputtering, reactive pulsed laser deposition (PLD), and dc magnetron sputtering among others are used for deposition of the nitride layers. Reactive dc sputtering is the oldest technique, and it has been the main process for depositing oxide and …
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Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application
Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18
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Determination of Ionization Fraction and Plasma Potential in a DC Magnetron Sputtering System Using a Quartz Crystal Microbalance and a Gridded Energy Analyzer
Made available in DSpace on 2017-07-06T18:48:17Z (GMT). No. of bitstreams: 3 Green_Karyn_M_MS.pdf: 35887684 bytes, checksum: 4d8ec8bef5ab4e9e6aabee4e3ff410a5 (MD5) Green_Karyn_M_MS_ABS.pdf: 507343 bytes, checksum: 0d504c63e61c048bbb16c0ee4bce83fa (MD5) license.txt: 4813 bytes, checksum: …
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Deposition and characterization of magnetron sputtered BCC tantalum
… (Ta) coatings on steel substrates deposited by DC magnetron sputtering. Deposition of tantalum on steel is of special interest for the protection it offers to surfaces, e.g. the surfaces of gun barrels against the erosive wear of hot propellant gases and the mechanical damage caused by the …
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Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys
… focus on the fabrication of thin film NiTi by DC magnetron sputtering deposition and testing mechanical properties of the fabricated films by nanoindentation. Thin film NiTi SMA was successfully created by DC magnetron sputtering deposition and high vacuum annealing in the Microfabrication …
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Reactive magnetron deposition and characterization of ZrN thin films for decorative and field emission applications
… Aluminium strip, brass strips and glass, by DC magnetron sputtering system under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature, and were characterized by SEM/EDX, AFM, Colour photospectrometer, RBS and resonant RBS. The films were found to be …
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Fabrication of metallic nanostructures from sputtered nanocluster precursors
… of copper nanocluster devices generated by DC magnetron sputtering and annealed at temperatures up to 1100 C. At each annealing step, the resistivity of the cluster device was measured and electron micrographs were taken of the cluster depositions. Nanoclusters have been studied for decades …
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Aging Effect in the Wettability of Nickel Nanorod Arrays
… arrays were deposited on silicon substrates by DC magnetron sputtering using an oblique angle of 85° with respect to the substrate normal. By changing the deposition time from 10 to 90 min., the diameter, height, and separation of the nanorods were varied. The water contact angles of each sample …
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Magnetic field optimization for high power impulse magnetron sputtering
"High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …
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Spin transport through nanopillar superconducting spin valves
… 200 nm Cu contact layers were deposited using dc magnetron sputtering, and fabricated into current-perpendicular-to-plane (CPP) nanopillars using optical lithography and Ar ion milling followed by focused ion beam milling. Magnetic and electrical characterisation of these devices at …
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Fabrication and characterization of multilayers for focusing hard x-ray optics
… time employing a consistent methodology for the DC magnetron sputtering growth of the multilayers and their characterization by x-ray reflectivity (XRR) measurements. The width of the interfaces was identified as the most important factor that must be controlled and minimized to achieve high …
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Radio frequency miniature passive devices: ferrite antennas and inductors
… are presented with a small direct current (DC) magnetic field, therefore, antenna miniaturization and gain improvement are achieved. A high-isolation multi-input multi-output (MIMO) antenna array design is demonstrated with miniature ferrite antenna elements for long-term evolution (LTE) …
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Sputter deposition and characterization of metal sandwiched indium tin oxide/silicon for solar cell application
… by radio frequency (RF) and direct current (DC) magnetron sputtering technique. The microstructural, topological, morphological, optical and electrical properties of the prepared films were investigated after undergoing post-annealing treatment in a range of 300-600oC in air. X-ray …
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Preparation Of Efficient Cuin1-xgaxse2-ysy/cds Thin-film Solar Cells By Optimizing The Molybdenum Back Contact And Using Diethylselenide as Selenium Precursor
… on 2.5 cm x 10 cm soda-lime glass using DC magnetron sputtering for studying the adhesion and chemical reactivity with selenium and sulfur containing gas at maximum film growth temperature. Mo being a refractory material develops stresses, nature of which depends on the deposition power …
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Synthesis and Characterization of Ag and Cu doped DLC Thin Films for Anti-microbial Applications
… on biomedical grade CoCrMo alloy discs using DC magnetron sputtering. The concentrations of Ag and Cu in the DLC matrix were controlled by varying the pulsed DC power to the Ag and Cu targets. The films' chemical composition, morphology, and bonding states of the films were evaluated using …
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Alternative transparent electrodes for organic light emitting diodes
… of abundant materials was investigated with DC magnetron sputtering under a wide range of experimental conditions. The optimised ZnO:Al received comparable performance with conventional ITO films, low sheet resistance of 22.8 Ω/sq as well as a high transparency of 93.1 % (average value in the …
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Synthesis and characterisation of DLC and diamond films for gas sensing applications
… alumina strips by using direct current (DC) magnetron sputtering system under varying conditions such as temperature, pressure, power, voltage, deposition rate, argon, nitrogen as well as oxygen gas flow rate. The as-deposited thin films were characterized using several characterization …
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Magnetism and spin transport studies on indium tin oxide
… Indium Oxide (ITO) thin films grown using DC magnetron sputtering. The manipulation of various deposition parameters allowed the electrical properties to be tuned effectively. With the desire to create multi-functional spintronic devices, a dilute magnetic oxide system is developed where …
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Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization
… of ion flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of barrier/seed layer deposition. Their plasma properties and metal …
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