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Showing 1 to 6 of 6 for “"collector optics"”.
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Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma
… manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, …
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Gibbsian Segregating Alloys Driven by Thermal and Concentration Gradients: A Potential Grazing Collector Optics Used in EUV Lithography
… issue for EUV lithography is the minimization of collector degradation from intense plasma erosion and debris deposition. Reflectivity and lifetime of the collector optics will be heavily dependent on surface chemistry interactions between fuels and various mirror materials, in addition to …
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Surface cleaning of optics by plasma (scope) with atomic hydrogen
… tools is the accumulation of fuel debris on the collector optics near the pinch region. Specifically, removal of deposited tin from the source onto the collector optics is needed to improve the lifetime of these optics and lower the cost of ownership. Most cleaning processes investigated thus far …
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Magnetic mitigation of energetic ions for extreme ultraviolet lithography sources
… EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel high-energy ions and neutral particles, which degrade the quality of collector optics. The mitigation of this debris is one of the main …
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Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources
… use of a pellicle to protect the collection optics, which reflect the produced light to an intermediate focus location. The debris limits the lifetime of the collector optics, and leads to a critical increase in cost of ownership. As such there is a necessity to incorporate new debris …
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Cleaning of tin debris by reactive ion etching in a discharge-produced EUV plasma source
… rate study, Sn samples were cleaned in a mock-up collector optics in an XTS 13-35 EUV source system to investigate the proposed cleaning technique method. The mock-up is made of two shells with different gap widths (4 cm, 7.5 cm and 10 cm) and with a length of 30 cm. Using a chlorine plasma with …