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Showing 1 to 3 of 3 for “"atmospheric pressure spatial atomic layer deposition"”.

  1. Ultraviolet-Assisted Atmospheric-Pressure Spatial Atomic Layer Depositions for Tuning ZnO Properties

    … investigates the development of UV-assisted Atmospheric Pressure Spatial Atomic Layer Deposition (UV-APSALD) as a technique for depositing ZnO films. A study of the current literature identifies the need for high-quality metal oxide thin films; metal oxides are near ubiquitous in modern day …

    cambridge Repository record for Ultraviolet-Assisted Atmospheric-Pressure Spatial Atomic Layer Depositions for Tuning ZnO Properties (opens in a new tab)

  2. Vapour-based growth of inorganic compounds for next-generation, stable photovoltaics

    … In the literature section, chemical vapour deposition is identified as a versatile family of growth techniques through which a wide range of materials can be grown, and morphologies accessed. Of these, furnace based chemical vapour deposition holds the advantages of ease of set up and …

    cambridge Repository record for Vapour-based growth of inorganic compounds for next-generation, stable photovoltaics (opens in a new tab)

  3. Developing next generation, non-toxic, inorganic materials for photovoltaics and thin-film transistors

    … BiOI films grown by thermal chemical vapour deposition (CVD) incorporated into an all-inorganic ITO/NiO<sub>*x*</sub>/BiOI/ZnO/Al stack demonstrate high external quantum efficiencies (80% at 450 nm wavelength). However, the 1.9 eV band gap of BiOI is not matched to terrestrial solar spectra; …

    cambridge Repository record for Developing next generation, non-toxic, inorganic materials for photovoltaics and thin-film transistors (opens in a new tab)