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Showing 1 to 16 of 16 for “"X-ray lithography"”.

  1. Aligned T-gate, fabrication using X-ray lithography

    Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.

    mit Repository record for Aligned T-gate, fabrication using X-ray lithography (opens in a new tab)

  2. Fabrication of distributed feeback devices using X-ray lithography

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.

    mit Repository record for Fabrication of distributed feeback devices using X-ray lithography (opens in a new tab)

  3. Optical and mechanical characterization of thin membranes for X-ray lithography

    Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.

    mit Repository record for Optical and mechanical characterization of thin membranes for X-ray lithography (opens in a new tab)

  4. Distortion analysis on an improved mask technology for X-ray lithography

    Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.

    mit Repository record for Distortion analysis on an improved mask technology for X-ray lithography (opens in a new tab)

  5. Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD

    … in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. <br> <br>The work consists of two main …

    freiburg-diss Repository record for Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD (opens in a new tab)

  6. Development of X-ray lithography and nanofabrication techniques for III-V optical devices

    … two lines: (1) development of an advanced x-ray mask system that addresses future nanolithography needs, and (2) development of fabrication techniques that addresses problems specific to Bragg-grating-based filters. A new x-ray mask configuration is described that improves many aspects of the …

    mit Repository record for Development of X-ray lithography and nanofabrication techniques for III-V optical devices (opens in a new tab)

  7. Sub-50nm x-ray lithography with application to a coupled quantum dot device

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998.

    mit Repository record for Sub-50nm x-ray lithography with application to a coupled quantum dot device (opens in a new tab)

  8. Optimization of image formation in X-ray lithography using rigorous electromagnetic theory and experiments

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.

    mit Repository record for Optimization of image formation in X-ray lithography using rigorous electromagnetic theory and experiments (opens in a new tab)

  9. X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication

    … the gate length. The gates are defined using X-ray lithography (a close-proximity shadow printing scheme). The associated alignment scheme, Interferometric Broad Band Imaging (IBBI), has been proven to yield nanometer level sensitivity. While the IBBI alignment system offers superior alignment …

    mit Repository record for X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication (opens in a new tab)

  10. Estimation of Future Manufacturing Costs for Nanoelectronics Technology

    … devices were also addressed. The use of x-ray lithography for the construction of devices on a 3nano-scale2 was considered. Next, cost trends within the microelectronics industry were explored. Although the cost per transistor has been observed to decrease, total equipment costs and …

    vt Repository record for Estimation of Future Manufacturing Costs for Nanoelectronics Technology (opens in a new tab)

  11. Self assembly of block copolymers : applicability in microelectronics and gains for patterned media

    … Introduction of newer method such as E-beam, X-ray lithography etc. has demonstrated possibility of scaling to lower dimensions. However most of these methods are too expensive, too complex or too slow. Hence a method is required which can provide high resolutions at low cost, is easy to …

    mit Repository record for Self assembly of block copolymers : applicability in microelectronics and gains for patterned media (opens in a new tab)

  12. Electrodeposited metal matrix nanocomposites as thin films and high aspect ratio microstructures for MEMS

    … Recessed electrodes were prepared using X-ray lithography. Partial current density, current efficiency and deposited particle concentration were determined with RDE’s. Cu--Al2O3, Cu-CeO2 and Cu-TiO2 micropost nanocomposites were successfully performed into 500 m deep recesses. Particle …

    lsu-thes Repository record for Electrodeposited metal matrix nanocomposites as thin films and high aspect ratio microstructures for MEMS (opens in a new tab)

  13. HIGH-PERFORMANCE PERIODIC ANTENNAS WITH HIGH ASPECT RATIO VERTICAL FEATURES AND LARGE INTERCELL CAPACITANCES FOR MICROWAVE APPLICATIONS

    … the SE-EBG-RA as the element of a series-fed array structure is investigated and some sample high-efficiency, flat array antennas are rendered. A microstrip antenna is also developed, the structure of which is composed of 3×3 unit cells and shows fast-wave behaviors. Most antenna designs are …

    sask Repository record for HIGH-PERFORMANCE PERIODIC ANTENNAS WITH HIGH ASPECT RATIO VERTICAL FEATURES AND LARGE INTERCELL CAPACITANCES FOR MICROWAVE APPLICATIONS (opens in a new tab)

  14. FABRICATION AND THERMAL ANALYSIS OF POLYIMIDE-BASED X-RAY MASKS AT THE SYNCHROTRON LABORATORY FOR MICRO AND NANO DEVICES, CANADIAN LIGHT SOURCE

    In deep X-ray lithography (DXRL), synchrotron radiation (SR) is applied to transfer absorber patterns on an X-ray mask into the photoresist to fabricate high-aspect-ratio micro and nano scale structures (HARMNST). The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) at the Canadian Light …

    sask Repository record for FABRICATION AND THERMAL ANALYSIS OF POLYIMIDE-BASED X-RAY MASKS AT THE SYNCHROTRON LABORATORY FOR MICRO AND NANO DEVICES, CANADIAN LIGHT SOURCE (opens in a new tab)

  15. Mikrostrukturierung präkeramischer Polymere mit Hilfe der UV- und Röntgentiefenlithographie

    Aufgrund ihrer herausragenden physikalischen und chemischen Eigenschaften gewinnt die Herstellung von Mikrokomponenten aus keramischen Materialien zunehmend an Bedeutung. Verschiedene Formgebungsverfahren wie das Hoch- und Niederdruck-Mikrospritzgießen keramischer Feedstocks sind etabliert. …

    freiburg-diss Repository record for Mikrostrukturierung präkeramischer Polymere mit Hilfe der UV- und Röntgentiefenlithographie (opens in a new tab)